Mechanism of CF Polymer Film Deposition through High-Aspect-Ratio SiO_2 Holes

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概要

• 論文の詳細を見る

• The deposition of polymer films through SiO_2 microholes was studied by using a multichannel capillary array (MCA). CHF_3 plasma polymer films were deposited on Si substrates through an MCA (hole diameter 10μm, aspect ratio 40) made of lead glass, and X-ray photoelectron spectroscopy was used to analyze the films. The deposition rate under MCA was higher than those of flat surfaces. Pb from the MCA material was detected in the film deposited through the MCA, and CF polymers deposited through the MCA were more carbon rich than those deposited outside the MCA. These results suggest that polymers reach the bottom of the hole by being etched from and redeposited on the sidewall.

• 社団法人応用物理学会の論文
• 1994-12-01

著者

• ONO Tetsuo

  Kasado Works, Hitachi, Ltd

• ONO Tetsuo

  Central Research Laboratory, Hitachi, Ltd.

• Ono T

  Osaka Univ. Osaka Jpn

• Hamasaki Ryoji

  Kasado Works Hitachi Ltd.

• MIZUTANI Tatsumi

  Central Research Laboratory, Hitachi, Ltd

• Mizutani Tatsumi

  Central Reseach Laboratory Hitachi Ltd.

• Ono Tetsuo

  Central Research Laboratory Hitachi Ltd.

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