Preferential Sputtering of Oxygen from SiO_2 by Low-Energy Ion Beam and Neutral Beam Bombardment
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概要
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Rutherford backscattering and Auger-electron spectroscopy measurements reveal that low-energy (500 eV) neutral Ne° beam bombardment on a SiO_2 surface does not cause preferential sputtering of oxygen, whereas Ne^+ ion beam bornbardment of the same energy causes significant preferential sputtering. The results strongly suggest that the ionic charge plays the dominant role in the preferential sputtering of oxygen from SiO_2. In addition, neutral-beam bombardment modifies the SiO_2 surface to be resistant to reduction by the subsequent ion beam bombardment. It is argued that neutral-beam bombardment produces densified SiO_2.
- 社団法人応用物理学会の論文
- 1991-04-01
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