Gas Phase Reaction Kinetics in Mercury-Photosensitized Decomposition of SiH_4 : Techniques, Instrumentations and Measurement
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1988-06-20
著者
-
IMAI Toshio
Department of Pediatrics, Sapporo Kousei Hospital
-
Imai Toshio
Department Of Electronic Engineering Faculty Of Technology Tokyo University Of Agriculture & Tec
-
KAMISAKO Koichi
Department of Engineering, Tokyo University of Agriculture and Technology
-
Tarui Yasuo
Department Of Electric Engineering Tokyo University Of Agriculture & Technology
-
Tarui Yasuo
Department Of Electronic Engineering Faculty Of Technology Tokyo University Of Agriculture & Tec
-
Kamisako Koichi
Department Of Electronic Engineering Faculty Of Technology Tokyo University Of Agriculture & Tec
-
Kamisako Koichi
Department of Electrical and Information Engineering, Tokyo University of Agriculture and Technology, 2-24-16 Nakamachi, Koganei, Tokyo 184-8588, Japan
関連論文
- Two Novel Mutations of Thiazide-Sensitive Na-Cl Cotransporter (TSC) Gene in Two Sporadic Japanese Patients with Gitelman Syndrome
- Stress in Pulsed-Laser-Crystallized Silicon Films
- Effect of Green Tea on Volatile Sulfur Compounds in Mouth Air
- Interaction of PbTiO_3 Films with Si Substrate ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Tantalum Oxide Films Formed by UV Photo-CVD Using Ozone and TaCl_5
- Serum Antibodies of Periodontitis Patients Compared to the Lipopolysaccharides of Porphyromonas gingivalis and Fusobacterium nucleatum
- Photo-Process of Tantalum Oxide Films and Their Characteristics : Surfaces, Interfaces and Films
- Gas Phase Reaction Kinetics in Mercury-Photosensitized Decomposition of SiH_4 : Techniques, Instrumentations and Measurement
- Partial clinical improvement in Upshaw-Schulman syndrome following prostacyclin infusion
- Structures of cDNAs Encoding the Muscle-Type and Non-Muscle-Type Isozymes of Lamprey Fructose Bisphosphate Aldolases and the Evolution of Aldolase Genes
- Analysis of Deposition Rate Distribution in the Photo-CVD of a-Si by a Unified Reactor with a Lamp
- Low-Temperature Growth of Transparent and Conducting Tin Oxide Film by Photo-Chemical Vapor Deposition
- Low-Temperature Growth of Silicon Dioxide Film by Photo-Chemical Vapor Deposition
- Doping-Induced Defects in P-Doped Photo-CVD a-Si:H
- Characterization of Photo-CVD a-Si:H Films by Thin-Film Transistor Structure
- Characterization of μc-Si:H Prepared by Photo-Chemical Vapor Deposition
- Photo-CVD of Tantalum Oxide Film from Pentamethoxy Tantalum for VLSI Dynamic Memories
- Electrical Conduction of Polyethylene Telephthalate Films
- Phosphorus Doping Properties of Hydrogenated Amorphous Silicon Prepared by Mercury Sensitized Photo-CVD : Condensed Matter
- Stress in Pulsed-Laser-Crystallized Silicon Films
- Effects of Hydrogen Radical Treatment on Fabrication of Catalyst Nanoparticles from Metal Oxide Film at Low Temperature and Synthesis of Silicon Nanowires
- Effect on Al2O3 Doping Concentration of RF Magnetron Sputtered ZnO:Al Films for Solar Cell Applications
- Fabrication of metal nanoparticles as catalyst at low temperature and growth of silicon nanostructures