Effects of Etching Time and Thickness on the Performance of the Microstrip Line Resonator of YBa_2Cu_3O_x Thin Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-04-15
著者
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HONG Seungbum
Department of Materials Science and Engineeing, KAIST
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NO Kwangsoo
Department of Materials Science and Engineeing, KAIST
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No Kwangsoo
Department Of Material Science And Engineering Korea Advanced Institute Of Science And Technology
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Hong S
Samsung Electronics Co. Ltd. Kyeonggi‐do Kor
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Sung T‐h
Korea Electric Power Research Institute
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Sung T‐h
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Sung Tae-hyun
Korea Electric Power Research Institute
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CHOI Jongwan
Department of Material Science and Engineering, Korea Advanced Institute of Science and Technology
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Choi J
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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Park Y
Korea Research Institute Of Standard Science
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Choi J
Department Of Material Science And Engineering Korea Advanced Institute Of Science And Technology
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Hong S
Sungkyunkwan Univ. Suwon Kor
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JUN Byung-Hyuk
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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PARK Yonggi
Korea Research Institute of Standard Science
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Jun B‐h
Inst. Physical And Chemical Res. (riken) Saitama Jpn
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Hong S
Korea Advanced Inst. Of Sci. And Technol. (kaist) Daejeon Kor
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Choi Jongwan
Department Of Material Science And Engineering Korea Advanced Institute Of Science And Technology
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Sung Tae-Hyun
Korea Electirc Power Research Institute, Taejon 305-380, Korea
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Hong Seungbum
Department of Electrical Engineering and Computer Science, KAIST
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