Simulation of Optical Constants Range of High-Transmittance Attenuated Phase-Shifting Masks Used in KrF Laser and ArF Laser
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-11-15
著者
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NO Kwangsoo
Department of Materials Science and Engineeing, KAIST
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Moon Seong-yong
Samsung Electronics Co. Ltd.
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No Kwangsoo
Department Of Material Science And Engineering Korea Advanced Institute Of Science And Technology
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Kim Yong-hoon
Samsung Electronics Co. Ltd.
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KIM Eunah
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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YOON Hee-sun
Samsung Electronics Co., Ltd.
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Kim Eunah
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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Yoon Hee-sun
Samsung Electronics Co. Ltd.
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Mooon Seong-yong
Samsung Electronics Co., Ltd.
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