Effects of Etching Time and Thickness on the Performance of the Microstrip Line Resonator of YBa2Cu3Ox Thin Films
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概要
- 論文の詳細を見る
Microstrip transmission lines in the form of an open-ended half-wavelength resonator were fabricated by depositing YBa2Cu3Ox thin films on MgO substrates using the pulsed laser deposition method. All YBa2Cu3Ox thin films had c-axis orientation. The effects of etching time and thickness on the performance of the microstrip line resonator were investigated. As the etching time increased, the loaded quality factor decreased and the surface resistance increased due to the undercut and the increase in roughness of the etched surface. The quality factor and the surface resistance showed a strong dependence on the film thickness. The superconducting properties and the microwave characteristics correlated well with the microstructure.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1999-04-15
著者
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No Kwangsoo
Department Of Material Science And Engineering Korea Advanced Institute Of Science And Technology
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JUN Byung-Hyuk
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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PARK Yonggi
Korea Research Institute of Standard Science
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Choi Jongwan
Department Of Material Science And Engineering Korea Advanced Institute Of Science And Technology
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Sung Tae-Hyun
Korea Electirc Power Research Institute, Taejon 305-380, Korea
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Hong Seungbum
Department of Electrical Engineering and Computer Science, KAIST
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Jun Byung-Hyuk
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Taejon 305-701, Korea
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No Kwangsoo
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Taejon 305-701, Korea
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Sung Tae-Hyun
Korea Electric Power Research Institute, Taejon, Korea
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