Instability of SiO_2 Film Caused by Fluorine and Chlorine Inclusion
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-08-15
著者
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NAKANISHI Toshiro
FUJITSU LABORATOIRES Ltd.
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Takasaki K
Ulsi Technology Laboratory Fujitsu Laboratories Ltd.
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Takasaki Kanetake
Fujitsu Laboratories Limited
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KAWAMOTO Tomokazu
Fujitsu Ltd.
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