Electric Resistance Changes of Metal Films Irradiated by a Weakly Ionized Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-08-15
著者
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MURAKAMI Hiroyuki
Department of Physics, Rikkyo University
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Murakami Hidetoshi
Department Of Applied Physics Hokkaido University
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Murakami H
Nhk Sci. And Technical Res. Lab. Tokyo Jpn
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KATSUMATA Teruo
Department of Electronics Technology, Tokyo Metropolitan College of Aeronautical Engineering
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KONNO Masaki
Faculty of Engineering, Tokyo Metropolitan Institute of Technology
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Murakami H
Department Of Applied Chemistry Graduate School Of Engineering Tokyo University Of Agriculture And T
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Konno Masaki
Faculty Of Engineering Tokyo Metropolitan Institute Of Technology
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Katsumata T
Department Of Applied Chemistry Toyo University
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Murakami H
Department Of Applied Physics Hokkaido University
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Murakami Hiroyuki
Department Of Aerospace Engineering Tokyo Metropolitan Institute Of Technology
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Katsumata Teruo
Department of Applied Chemistry, Toyo University
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