Electron Beam Evaporator for In Situ Deposition Studies of Refractory Metal Thin Films in UHV Electron Microscope
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概要
- 論文の詳細を見る
A miniaturized electron beam evaporator was constructed with two independent elements to be used for UHV in situ electron microscopy of growth processes of thin films of refractory metals. Using this system W, Ta, Mo, Nb, V, Cr and Fe were evaporated onto clean magnesium oxide and molybdenite thin crystals. The deposits were found to show definite epitaxy without showing any effect of oxidation when the substrates were surrounded by a liquid helium-cooled cryogenic tip.
- 社団法人応用物理学会の論文
- 1980-01-05
著者
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TAKAYANAGI Kunio
Physics Department, Tokyo Institute of Technology
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Takayanagi Kunio
Physics Department Tokyo Institute Of Technology
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Takayanagi Kunio
Tokyo Institute Of Technology Material Science And Engineering
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Honjo Goro
Tokyo Institute Of Technology
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YAGI Katsumichi
Tokyo Institute of Technology
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Takayanagi Kunio
Tokyo Institute Of Technology
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Yagi Katsumichi
Physics Department Tokyo Institute Of Technology
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MORI Koh-ichi
Tokyo Institute of Technology
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KOBAYASHI Kunio
Tokyo Institute of Technology
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