UHV-REM Study of Changes in the Step Structures on Clean (100) Silicon Surfaces by Annealing

スポンサーリンク

概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1987-04-20

著者

• Inoue Naohisa

  Ntt Electrical Communications Laboratories

• Tanishiro Yasumasa

  Tokyo Institute Of Technology

• YAGI Katsumichi

  Tokyo Institute of Technology

• Inoue Naohisa

  Ntt Electrical Communication Laboratories

関連論文

• UHV-REM Study of Changes in the Step Structures on Clean (100) Silicon Surfaces by Annealing
• Monolayer and Bilayer High Steps on Si(001)2×1 Vicinal Surface
• Macroscopic Axial Dopant Distribution in Czochralski Silicon Crystals Grown in a Vertical Magnetic Field
• Electron Beam Evaporator for In Situ Deposition Studies of Refractory Metal Thin Films in UHV Electron Microscope
• Electron Microscopic Study of Single Crystal Films of NaCl Containing CaCl_2
• Transmission Electron Microscopy of Sodium Chloride Films Prepared by Electron Beam Flashing Thinning Technique

スポンサーリンク