An Ion-Sputtering Gun to Clean Crystal Surfaces In-Situ in an Ultra-High-Vacuum Electron Microscope

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概要

• 論文の詳細を見る

• The design and performance of an ion-sputtering gun for cleaning crystal surfaces in-situ in an ultra-high-vacuum electron microscope are reported. The electron microscopic aspects of ion-bombardment damage to ionic magnesium oxide, covalent germanium and silicon, and metallic gold and copper crystals, and the effects of annealing after and during sputtering are described. The growth of various kinds of films deposited in-situ on crystals cleaned by ion-sputtering are described and discussed.

• 社団法人応用物理学会の論文
• 1980-10-05

著者

• Yagi Katsumichi

  Physics Department,Tokyo Institute of Technology

• TAKAYANAGI Kunio

  Physics Department, Tokyo Institute of Technology

• Takayanagi Kunio

  Physics Department Tokyo Institute Of Technology

• Morita Etsuo

  Physics Department Tokyo Institute Of Technology

• HONJO Goro

  Physics Department, Tokyo Institute of Technology

• Honjo Goro

  Physics Department Tokyo Institute Of Technology

• KOBAYASHI Kunio

  Physics Department, Tokyo Institute of Technology

• Takayanagi Kunio

  Tokyo Institute Of Technology

• Yagi Katsumichi

  Physics Department Tokyo Institute Of Technology

• Kobayashi Kunio

  Physics Department Tokyo Institute Of Technology

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