基板公転スパッタFe-Al-O軟磁性膜の磁気異方性

概要

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We examined the magnetic anisotropy of Fe-Al-O films with Bs〜1.8T and ρ〜lμΩ m. The films were sputtered using the compacted target of Fe and Al_2O_3 powders. The magnetic anisotropy of the as-deposited Fe-AI-O films strongly depends on Ar pressure during sputtering. That is, the phase of easy axis shifts to 90 degree as the pressure increase. The Fe-Al-O films have an anisotropic film morphology such as grain shape and crystal orientation. It seems that the origin of uniaxial magnetic anisotropy in the Fe-Al-O films closely relates to the following factors. i) Magnetic anisotropy which directly originates in the anisotropic microstructure. ii) Magnetoelastic effect causing by anisotropic residual stress which is induced to the anisotropic microstructure.
社団法人日本磁気学会の論文
2002-06-01