Real-Time Analyses of Strain in Ultrathin Silicon Nanolayers on Insulators during Thermal Oxidation
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2009-12-25
著者
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TSUSAKA Yoshiyuki
Graduate School of Material Science, University of Hyogo
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KAGOSHIMA Yasushi
Graduate School of Material Science, University of Hyogo
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KOBAYASHI Yoshihiro
NTT Basic Research Laboratories
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OMI Hiroo
NTT Basic Research Laboratories, NTT Corporation
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Kagoshima Y
Photon Factory National Laboratory For High Energy Physics
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Omi Hiroo
Ntt Basic Research Laboratories
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Kawamura Tomoaki
Ntt Basic Research Laboratories Nippon Telegraph And Telephone Corporation
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Matsui Junji
Center For Advanced Science And Technologies
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Omi Hiroo
Ntt Basic Research Laboratories Ntt Corporation
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FUJIKAWA Seiji
Graduate School of Material Science, University Hyogo
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Kawamura Tomoaki
Ntt Basic Research Laboratories Ntt Corporation
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Fujikawa Seiji
Graduate School Of Material Science University Hyogo
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Kagoshima Y
Graduate School Of Material Science University Of Hyogo
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Tsusaka Yoshiyuki
Graduate School Of Material Science University Of Hyogo
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Kobayashi Yoshihiro
Ntt Basic Research Laboratories Ntt Corporation
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Tsusaka Yoshiyuki
Graduate School and Faculty of Science, Himeji Institute of Technology, 3-2-1 Kouto, Kamigori, Ako, Hyogo 678-1297, Japan
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Kagoshima Yasushi
Graduate School and Faculty of Science, Himeji Institute of Technology, 3-2-1 Kouto, Kamigori, Ako, Hyogo 678-1297, Japan
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