NBTI-Stress Induced Grain-Boundary Degradation in Low-Temperature Poly-Si Thin-Film Transistors
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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Wang Shen-de
Institute Of Electronics National Chiao Tung University
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Ma Ming-wen
Institute And Department Of Electronics Engineering National Chiao Tung University
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Ma Ming-wen
Institute Of Electronics National Chiao Tung University
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Chen Chih-yang
Institute Of Electronics National Chiao Tung University
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Lin Hsiao-yi
Toppoly Optoelectronics Corp.
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CHEN Wei-Cheng
Toppoly Optoelectronics Corp.
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YEH Kuan-Lin
Toppoly Optoelectronics Corp.
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LEI Tan-Fu
Institute of Electronics, National Chiao Tung University
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Lei Tan-fu
Institute Of Electronics National Chiao Tung University
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Lei Tan-fu
Institute And Department Of Electronics Engineering National Chiao Tung University
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Chen Chih-yang
Institute Of Electro-optical Engineering National Chiao Tung University
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