Growth of Thick 4H-SiC(0001) Epilayers and Reduction of Basal Plane Dislocations
スポンサーリンク
概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2005-07-10
著者
-
TSUCHIDA Hidekazu
Central Research Institute of Electric Power Industry
-
KAMATA Isaho
Central Research Institute of Electric Power Industry
-
Sugawara Yoshitaka
The Kansai Electric Power Co. Inc
-
Sugawara Yoshitaka
The Kansai Electric Power Co. Inc.
-
Nakayama Koji
The Kansai Electric Power Co. Inc.
-
MIYANAGI Toshiyuki
Central Research Institute of Electric Power Industry
-
NAKAMURA Tomonori
Central Research Institute of Electric Power Industry
-
ISHII Ryousuke
Central Research Institute of Electric Power Industry
関連論文
- Electrical Characteristics of Interface Defects in Oxides Grown at 1200℃ in Dry Oxygen Ambient on Silicon Carbide and Their
- Epitaxial Growth of Thick 4H-SiC Layers with a Reduced Micropipe Density in a Vertical Hot-Wall Reactor
- Drift phenomena of forward and reverse recovery characteristics in {0001} 4H-SiC p-i-n diode (Special issue: Solid state devices and materials)
- Growth of Thick 4H-SiC(0001) Epilayers and Reduction of Basal Plane Dislocations
- Improvement in Electrical Properties of 4H-SiC Epilayers by Micropipe Dissociation(Semiconductors)
- Structural Transformation of Screw Dislocations via Thick 4H-SiC Epitaxial Growth
- Epitaxial Growth of a Low-Doped 4H-SiC Layer on a Micropipe Stop Layer : Semiconductors
- Si-H Bonds on the 6H -SiC(0001) Surface after H_2 Annealing
- Chemical States of Crystalline Silicon Carbide Surfaces
- Power Loss Estimation Analysis Based on Experimental Power Switching Device Data for Three-Phase ARCP Assisted Soft Switching Inverter(Energy in Electronics Communications)
- Influence of 4H-SiC Growth Conditions on Micropipe Dissociation : Semiconductors
- Development of 4H--SiC Epitaxial Growth Technique Achieving High Growth Rate and Large-Area Uniformity
- Polarization of Photoluminescence from Partial Dislocations in 4H-SiC
- Plan-View and Cross-Sectional Photoluminescence Imaging Analyses of Threading Dislocations in 4H-SiC Epilayers (Special Issue : Solid State Devices and Materials)
- Suppression of Al Memory-Effect on Growing 4H-SiC Epilayers by Hot-Wall Chemical Vapor Deposition