Direct Modification of Magnetic Domains in Co Nanostructures by Atomic Force Microscope Lithography
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2005-03-10
著者
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Yamada Tsutomu
Department Of Electrical And Computer Engineering Yokohama National University
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TAKEMURA Yasushi
Electrical and Computer Engineering, Yokohama National University
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HAYASHI Satomi
Electrical and Computer Engineering, Yokohama National University
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OKAZAKI Fuminori
Electrical and Computer Engineering, Yokohama National University
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YAMADA Tsutomu
Electrical and Computer Engineering, Yokohama National University
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SHIRAKASHI Jun-ichi
Electrical and Electronic System Engineering, Tokyo University of Agriculture and Technology
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Hayashi Satomi
Electrical And Computer Engineering Yokohama National University
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Shirakashi Jun‐ichi
Department Of Electrical And Electronic System Engineering Tokyo University Of Agriculture And Techn
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Yasushi Takemura
Department Of Electrical And Computer Engineering Yokohama National University
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Takemura Yasushi
Electrical And Computer Engineering Yokohama National University
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Okazaki Fuminori
Electrical And Computer Engineering Yokohama National University
関連論文
- Magnetization Switching of Magnetic Submicron Structure Fabricated by Atomic Force Microscope
- AFM Nano-oxidation of NiFe Thin Films Capped with Al-Oxide Layers for Planar-type Tunnel Junction
- Direct Modification of Magnetic Domains in Co Nanostructures by Atomic Force Microscope Lithography
- Surface Modification of Niobium (Nb) by Atomic Force Microscope (AFM) Nano-Oxidation Process
- Fabrication and Characterization of Nb/Nb Oxides-Based Single Electron Transistors (SETs)
- Side Gate Single Electron Transistor with Multi-Islands Structure Operated at Room Temperature Made by STM/AFM Nano-Oxidation Process
- Single Electron Transistor on Atomically Flat α-Al_2O_3 Substrate Made by AFM Nano-Oxidation Process
- Room Temperature Nb-Based Single-Electron Transistors
- Room Temperature Nb-Based Single-Electron Transistors
- Single-Electron Transistors (SETs) with Nb/Nb Oxide System Fabricated by Atomic Force Microscope (AFM) Nano-Oxidation Process
- Nb/Nb Oxide-based Planar-Type Metal/Insulator/Metal (MIM) Diodes Fabricated by Atomic Force Microscope (AFM) Nano-Oxidation Process
- Planer-type Ferromagnetic Tunnel Junctions Fabricated by Atomic Force Microscope for Nonvolatile Memory
- Characterization of Polarity of Plasma-Assisted Molecular Beam Epitaxial GaN{0001}Film Using Coaxial Impact Collision Ion Scattering Spectroscopy
- Computer Simulation for Analysis of Lattice Polarity of Wurtzite GaN{0001} Film by Coaxial Impact Collision Ion Scattering Spectroscopy
- Room Temperature Operation of Amorphous Carbon-Based Single-Electron Transistors Fabricated by Beam-Induced Deposition Techniques
- Single-Electron Tunneling through Amorphous Carbon Dots Array
- NiFe-Based Nanostructures Fabricated Using an Atomic Force Microscope
- Room Temperature Nb-Based Single-Electron Transistors