Analysis of the Photochemical Reaction on the Surface for Room Temperature Deposition of SiO_2 Thin Films by Photo-CVD using Vacuum Ultraviolet Light
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-02-15
著者
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KUROSAWA Kou
Department of Electrical Engineering, Miyazaki University
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YOKOTANI Atsushi
Department of Electrical and Electronic Engineering, University of Miyazaki
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MAEZONO Yoshinari
Department of Electrical and Electronic Engineering and Photon Science Center, University of Miyazak
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Yokotani Atsushi
Univ. Miyazaki Miyazaki Jpn
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TOSHIKAWA Kiyohiko
Department of Electrical and Electronic Engineering, University of Miyazaki
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AMARI Kouichi
Department of Electrical and Electronics engineering, Faculty of Engineering, University of Miyazaki
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