Amorphous Silicon Film Deposition from SiH_4 by Chemical Vapor Deposition with Argon Excimer Lamp
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-11-30
著者
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KUROSAWA Kou
Department of Electrical Engineering, Miyazaki University
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YOKOTANI Atsushi
Department of Electrical and Electronic Engineering, University of Miyazaki
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Yokotani Atsushi
Univ. Miyazaki Miyazaki Jpn
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TOSHIKAWA Kiyohiko
Department of Electrical and Electronic Engineering, University of Miyazaki
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- Erratum: "Amorphous Silicon Film Deposition from SiH4 by Chemical Vapor Deposition with Argon Excimer Lamp"