Preparation of Carbon Films by Hot-Filament-Assisted Sputtering for Field Emission Cathode

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-01-30

著者

• ABE Katsuya

  Department of Physical Electronics, Tokyo Institute of Technology

• KAMIMURA Kiichi

  Department of Electric and Electronic Engineering, Faculty of Engineering, Shinshu University

• NAKAO Masato

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Shinshu University

• Kamimura K

  Faculty Of Engineering Shinshu University

• Kamimura K

  Keio Univ. Yokohama Jpn

• HAYASHIBE Rinpei

  Department of Electrical and Electronic Engineering, Shinshu University

• YAMAKAMI Tomohiko

  Department of Electrical and Electronic Engineering, Shinshu University

• MAEZAWA Yosuke

  Department of Electrical and Electronic Engineering, Shinshu University

• Maezawa Yosuke

  Department Of Electrical And Electronic Engineering Shinshu University

• Hayashibe R

  Faculty Of Engineering Shinshu University

• Nakao Masato

  Faculty Of Engineering Shinshu University

関連論文

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• Phosphorous Doping of Strain-Induced Si_C_y Epitaxial Films Grown by Low-Temperature Chemical Vapor Deposition
• P-Doping into Strain-Induced Si_C_y Epitaxial Films Grown by Low Temperature Chemical Vapor Deposition
• Epitaxial Growth of Si_C_y Film by Low Temperature Chemical vapor Deposition
• Characterization of Tensile Strained Si_1_yCy Alloy Grown by Photo- and Plasma Chemical Vapor Deposition at Very Low Temperature
• Interface State Density between Direct Nitridation Layer and SiC Estimated from Current Voltage Characteristics of MIS Schottky Diode
• Contact Resistance of SnO_2 Films Determined by the Transmission Line Model Method
• Preparation and Piezoresistive Properties of Polycrystalline SnO_2 Films
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• Polycrystalline Boron Films Prepared by Plasma CVD
• Preparation of a Thin Silicon Nitride Layer by Photo-CVD and Its Application to InP MISFET's
• Characterization of Nitride Layer on 6H-SiC Prepared by High-Temperature Nitridation in NH_3
• Preparation of Carbon Films by Hot-Filament-Assisted Sputtering for Field Emission Cathode
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• Model Calculation for the Field Enhancement Factor of Carbon Nanowall Array
• Characterization of Al-based insulating films fabricated by physical vapor deposition
• Characterization of Nitride Layer on 6H-SiC Prepared by High-Temperature Nitridation in NH3
• Preparation of Carbon Films by Hot-Filament-Assisted Sputtering for Field Emission Cathode

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