スポンサーリンク
Anelva Corporation | 論文
- New Ultra-High-Frequency Plasma Source for Large-Scale Etching Processes
- Ion Current Density and Ion Energy Distributions at the Electron Cyclotron Resonance Position in the Electron Cyclotron Resonance Plasma
- Variation of Radial Plasma Density Profile with the Excitation Frequency in a Magnetron-Type Plasma
- Modified Magnetron Type Plasma Source for Etching Applications
- Measurements of Power Absorption in a Modified Magnetron-type Discharge
- SI-2 A Study on Physiological Polymorphism in Thermoregulation during Exercise (Proceedings of the 49th Meeting of Japan Society of Physiological Anthropology)
- 新製品・新技術紹介 超短光パルスレーザーの絶対位相制御
- Dependence of Electron Energy Distributions on Discharge Pressure in Ultrahigh-Frequency and Inductive-Coupled Cl_2 Plasmas
- Damage Induced by Electron Cyclotron Resonance Plasma Etching on Silicon Surface
- Etching Characteristics by M=0 Helicon Wave Plasma ( Plasma Processing)
- Dielectric and Piezoelectric Properties of 0.93Pb(Zn_Nb_)O_3-0.07PbTiO_3 Piezoelectric Single Crystals for Medical Array Transducers
- Temperature Dependence of Dielectric and Piezoelectric Properties of Pb (Zn_Nb_) O_3-PbTiO_3 Piezoelectric Single Crystals(Electrical Properties of Condensed Matter)
- Selective Epitaxial Growth of Si and Si_Ge_x Films by Ultrahigh-Vacuum Chemical Vapor Deposition Using Si_2H_6 and GeH_4
- In Situ Monitoring of Al Growth in Chemical Vapor Deposition by Detecting Reflected Laser Light Intensity
- Preparation of Pb(Zr, Ti)O_3 Thin Films by Multitarget Sputtering ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Preparation of Pb(Zr,Ti)O_3 Thin Films by Multi-Target Sputtering
- Pb(Zr, Ti)O_3 Thin-Film Preparation by Multitarget Magnetron Sputtering
- Bottom Coverage of Cu Deposit for 200-nm-Class Circular Vias with High Aspect Ratios Investigated by Magnetron Sputtering Activated Using Superconducting Bulk Magnet
- High-Vacuum Planar Magnetron Sputtering
- Electrode Temperature Effect in Narrow-Gap Reactive Ion Etching