Bottom Coverage of Cu Deposit for 200-nm-Class Circular Vias with High Aspect Ratios Investigated by Magnetron Sputtering Activated Using Superconducting Bulk Magnet

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-09-15

著者

• MIZUTANI Uichiro

  Department of Crystalline Materials Science, Nagoya University

• IKUTA Hiroshi

  Department of Crystalline Materials Science, Nagoya University

• SEKIGUCHI Atsushi

  ANELVA Corporation

• YANAGI Yousuke

  IMRA Material R & D Co Ltd.

• ITOH Yoshitaka

  IMRA Material R & D Co Ltd.

• Itoh Y

  Imra Material R&d Co. Ltd.

• Imai Atsuo

  Nagoya Municipal Industrial Research Institute

• HAZAMA Hirofumi

  Nagoya Industrial Science Research Institute

• MATSUDA Takashi

  DIAX Co., Ltd.

• SAKURAI Kazuo

  ANELVA CORP.

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