Factors Affecting Extreme Ultraviolet Reflectivity of Mo/Si Multilayer Films Synthesized by Superconducting Magnetron Sputtering

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概要

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• We first tried to determine the thickness of both Si-on-Mo and Mo-on-Si interdiffusion layers inherent in the Mo/Si multilayer films by taking high angle angular dark-field-scanning transmission electron microscopy (HAADF-STEM) images. Secondly, the origin of 2–5% shortage of the measured extreme ultraviolet (EUV) reflectivity relative to that expected from the Fresnel equation has been investigated from two possible viewpoints: one, the presence of residual Xe gas atoms incorporated into the film during deposition in the reduced Xe gas atmosphere, and the other, a gradual shift of the layer periodicity over an entire cycle of repeated depositions. By analyzing the grazing incident X-ray reflectivity (GIXR) spectra for the 50-layer films, we were able to demonstrate that the latter is responsible for lowering the EUV reflectivity.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2009-02-25

著者

• YANAGI Yousuke

  IMRA Material R & D Co Ltd.

• ITOH Yoshitaka

  IMRA Material R & D Co Ltd.

• Ikuta Hiroshi

  Department Of Applied Physics The University Of Tokyo

• MIZUTANI Uichiro

  Toyota Physical and Chemical Research Institute

• Matsunami Noriaki

  Division Of Energy Science Ecotopia Science Institute Nagoya University

• Yamaguchi Takashi

  Japan Science and Technology Agency, Innovation Plaza Tokai, Nagoya 457-0063, Japan

• Tomofuji Tetsuya

  Nikon Corporation, Sagamihara, Kanagawa 228-0828, Japan

• Saitoh Koh

  Division of Nano-Materials Science, EcoTopia Science Institute, Nagoya University, Nagoya 464-8603, Japan

• Tanaka Nobuo

  Division of Nano-Materials Science, EcoTopia Science Institute, Nagoya University, Nagoya 464-8603, Japan

• Mizutani Uichiro

  Toyota Physical and Chemical Research Institute, Nagakute, Aichi 480-1192, Japan

• Itoh Yoshitaka

  IMRA Material R&D Co., Ltd., Kariya, Aichi 448-0032, Japan

• Yanagi Yousuke

  IMRA Material R&D Co., Ltd., Kariya, Aichi 448-0032, Japan

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