In Situ Monitoring of Al Growth in Chemical Vapor Deposition by Detecting Reflected Laser Light Intensity
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-04-01
著者
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Kishida Shunji
Opto-electronics Research Laboratories Nec Corporation:(present Address)analysis And Evaluation Tech
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SUGAI Kazumi
Opto-Electronics Research Laboratories, NEC Corporation
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OKABAYASHI Hidekazu
Research and Development Group, NEC Corporation
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KOBAYASHI Akiko
ANELVA Corporation
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YAKO Tadaaki
Sumitomo Chemical Company Limited
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Sugai K
Opto-electronics Research Laboratories Nec Corporation
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Okabayashi Hidekazu
Research And Development Group Nec Corp.
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Sugai Kazumi
Opto-electronics Research Laboratories Nec Corporation
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- In Situ Monitoring of Al Growth in Chemical Vapor Deposition by Detecting Reflected Laser Light Intensity
- Depth-Resolved In - Situ TEM Observation of Electromigration in a Submicron-Wide Layered Al–0.5%Cu Line
- In Situ Study of Electromigration in Submicron-Wide Layered Al-0.5%Cu Lines by Side-View TEM Observation