Yoshimaru Masaki | Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
スポンサーリンク
概要
関連著者
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Yoshimaru Masaki
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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MONIWA Masahiro
Semiconductor Technology Academic Research Center
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Yamashita Ichiro
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Uraoka Yukiharu
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Ohara Kosuke
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Yaegashi Toshitake
Semiconductor Technology Academic Research Center
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Uraoka Yukiharu
Graduate School of Material Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan
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FUJII Takashi
Graduate School of Engineering, Hokkaido University
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浦岡 行治
奈良先端科学技術大学院大
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Arita Masashi
Graduate School Of Engineering Hokkaido University
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Takahashi Yasuo
Graduate School Of Information Science And Technology Hokkaido Univ.
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HATTORI Nobuyoshi
Semiconductor Technology Academic Research Center
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Koiwa Ichiro
Department of Applied Material and Life Science, Faculty of Engineering, Kanto Gakuin University
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Koiwa Ichiro
Department Of Applied Material And Life Science Faculty Of Engineering Kanto Gakuin University
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Koiwa Ichiro
Department Of Applied Chemistry Science And Engineering Waseda University
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Ashikaga Kinya
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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Kanehara Takao
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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Fuyuki Takashi
Graduate School Of Material Science Nara Institute Of Science And Technology
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Moniwa Masahiro
Graduate School Of Information Sci. And Technol. Hokkaido Univ. Sapporo 060-0814 Japansemiconductor
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Eguchi Kazuhiro
Semiconductor Company Toshiba Corporation
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Takaya Koji
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Hig
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Yoshimaru Masaki
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Hig
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Kosemura Daisuke
School Of Science And Engineering Meiji University
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Ogura Atsushi
School Of Science And Engineering Meiji University
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Takaya Koji
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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Yoshimaru Masaki
Graduate School Of Information Sci. And Technol. Hokkaido Univ. Sapporo 060-0814 Japansemiconductor
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Ohara Kosuke
Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Iko
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Yaegashi Toshitake
Semiconductor Technology Academic Research Center, 3-17-2 Shinyokohama, Kohoku-ku, Yokohama 222-0033
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Moniwa Masahiro
Semiconductor Technology Academic Research Center, 3-17-2 Shinyokohama, Kohoku-ku, Yokohama 222-0033
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Kakemura Yasuto
School Of Science And Technology Meiji University
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Yoshida Tetsuya
School Of Science And Technology Meiji University
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Yamashita Ichiro
Panasonic Corp. Kyoto Jpn
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Uedono Akira
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
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Uedono Akira
Institute of Applied Physics and Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba 305-8573, Japan
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Moniwa Masahiro
Semiconductor Technology Academic Research Center, 3-17-2 Shinyokohama, Kohoku-ku, Yokohama 222-0033, Japan
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Inoue Naoya
Semiconductor Technology Academic Research Center, Kohoku, Yokohama 222-0033, Japan
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Hayashi Yoshihiro
Semiconductor Technology Academic Research Center, Kohoku, Yokohama 222-0033, Japan
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Hirose Yukinori
Semiconductor Technology Academic Research Center, Kohoku, Yokohama 222-0033, Japan
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Nakamura Tomoji
Semiconductor Technology Academic Research Center, Kohoku, Yokohama 222-0033, Japan
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Oshima Nagayasu
Research Institute of Instrumentation Frontier, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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Ohdaira Toshiyuki
Research Institute of Instrumentation Frontier, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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Suzuki Ryoichi
Research Institute of Instrumentation Frontier, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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Yaegashi Toshitake
Semiconductor Technology Academic Research Center, 3-17-2 Shinyokohama, Kohoku-ku, Yokohama 222-0033, Japan
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Ohara Kosuke
Graduated School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
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Nakamura Tomoji
Semiconductor Technology Academic Research Center, 17-2 Shin Yokohama 3-chome, Kohoku, Yokohama 222-0033, Japan
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Yoshimaru Masaki
Semiconductor Technology Academic Research Center, Kohoku, Yokohama 222-0033, Japan
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Yoshimaru Masaki
Semiconductor Technology Academic Research Center, 3-17-2 Shinyokohama, Kohoku-ku, Yokohama 222-0033, Japan
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Yoshimaru Masaki
Semiconductor Technology Academic Research Center, 3-17-2 Shinyokohama, Kouhoku-ku, Yokohama 220-0033, Japan
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Hattori Nobuyoshi
Semiconductor Technology Academic Research Center, 3-17-2 Shinyokohama, Kouhoku-ku, Yokohama 220-0033, Japan
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Uchida Hidetsugu
Semiconductor Technology Academic Research Center, 3-17-2 Shinyokohama, Kouhoku-ku, Yokohama 220-0033, Japan
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Eguchi Kazuhiro
Semiconductor Technology Academic Research Center, Kohoku, Yokohama 222-0033, Japan
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Oshima Nagayasu
Research Institute of Instrumentation Frontier, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Suzuki Ryoichi
Research Institute of Instrumentation Frontier, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Kondo Hirofumi
Graduate School of Information Science and Technology, Hokkaido University, Sapporo 060-0814, Japan
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Kaji Hiromichi
Graduate School of Information Science and Technology, Hokkaido University, Sapporo 060-0814, Japan
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Yamaguchi Takeshi
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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Fujiwara Ichiro
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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Takahashi Yasuo
Graduate School of Engineering, Oita University
著作論文
- Reduction of Process-induced Damage and Improvement of Imprint Characteristics in SrBi2Ta2O9 Capacitors by Postmetallization Annealing
- Floating Gate Memory with Biomineralized Nanodots Embedded in High-$k$ Gate Dielectric
- Evaluation of Strain in Si-on-Insulator Substrate Induced by Si3N4 Capping Film
- The Observation of "Conduction Spot" on NiO Resistance Random Access Memory
- Floating Gate Memory Based on Ferritin Nanodots with High-$k$ Gate Dielectrics
- Characterization of Low-$k$/Cu Damascene Structures Using Monoenergetic Positron Beams