Yamaguchi Takeshi | Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
スポンサーリンク
概要
関連著者
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Yamaguchi Takeshi
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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FUJII Takashi
Graduate School of Engineering, Hokkaido University
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Arita Masashi
Graduate School Of Engineering Hokkaido University
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Takahashi Yasuo
Graduate School Of Information Science And Technology Hokkaido Univ.
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Eguchi Kazuhiro
Semiconductor Company Toshiba Corporation
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Yoshimaru Masaki
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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Sekine Katsuyuki
Semiconductor Company Toshiba Corporation
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Takayanagi Mariko
Semiconductor Company Toshiba Corporation
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Nakasaki Yasushi
Corporate R&D Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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MONIWA Masahiro
Semiconductor Technology Academic Research Center
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Mitani Yuichiro
Corporate Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
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Hirano Izumi
Corporate Research & Development Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Kondo Hirofumi
Graduate School of Information Science and Technology, Hokkaido University, Sapporo 060-0814, Japan
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Kaji Hiromichi
Graduate School of Information Science and Technology, Hokkaido University, Sapporo 060-0814, Japan
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Fujiwara Ichiro
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
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Iijima Ryosuke
Corporate Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
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Takahashi Yasuo
Graduate School of Engineering, Oita University
著作論文
- Effects of Electron Current and Hole Current on Dielectric Breakdown in HfSiON Gate Stacks
- The Observation of "Conduction Spot" on NiO Resistance Random Access Memory