Mitani Yuichiro | Corporate Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
スポンサーリンク
概要
- Mitani Yuichiroの詳細を見る
- 同名の論文著者
- Corporate Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japanの論文著者
関連著者
-
Mitani Yuichiro
Corporate Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
-
Hirano Izumi
Corporate Research & Development Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
-
Eguchi Kazuhiro
Semiconductor Company Toshiba Corporation
-
Sekine Katsuyuki
Semiconductor Company Toshiba Corporation
-
Takayanagi Mariko
Semiconductor Company Toshiba Corporation
-
Nakasaki Yasushi
Corporate R&D Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
-
Hirano Izumi
Corporate Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
-
Saitoh Masumi
Corporate Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
-
Numata Toshinori
Corporate Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
-
Yamaguchi Takeshi
Semiconductor Technology Academic Research Center, Yokohama 222-0033, Japan
-
Iijima Ryosuke
Corporate Research and Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
著作論文
- Effects of Electron Current and Hole Current on Dielectric Breakdown in HfSiON Gate Stacks
- Characteristics of Defect Generation and Breakdown in SiO2 for Polycrystalline Silicon Channel Field-Effect Transistor