Khoo Khyoupin | Department Of Materials Science And Engineering Ibaraki University
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概要
関連著者
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Onuki Jin
Department Of Electronic And Information Systems Faculty Of Systems Science And Technology Akita Pre
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Khoo Khyoupin
Department Of Materials Science And Engineering Ibaraki University
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Chonan Yasunori
Department Of Electronics And Information System Faculty Of System Science And Technology Akita Pref
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Akahoshi Haruo
Hitachi Research Laboratory Hitachi Ltd.
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ONUKI Jin
Department of Materials Science and Engineering, Ibaraki University
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Onuki Jin
Akita Prefectural University
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Onuki J
Dep. Of Materials Sci. And Engineering Ibaraki Univ.
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Onuki J
Akita Prefectural Univ. Honjo Jpn
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Tobita Toshimi
Hitachi Kyowa Engineering Ltd.
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Khoo Khyoupin
Graduate School Of Science And Engineering Ibaraki University
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KHOO Khyoupin
Department of Materials Science and Engineering, Ibaraki University
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NAGANO Takahiro
Department of materials science and Engineering, Ibaraki University
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Ishikawa Kensuke
Micro Device Division Hitachi Ltd.
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Chiba Masahiro
Hitachi Kyowa Engineering Co., Ltd., Hitachi, Ibaraki 319-1292, Japan
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AKAHOSHI Haruo
Hitachi Research Laboratory, Hitachi Ltd.
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Nishida Takashi
Central Research Laboratory Hitachi Ltd.
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CHONAN Yasunori
Department of Electronics and Information Systems, Faculty of Systems Science and Technology, Akita
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Nagano Tomohiro
Department Of Physics Faculty Of Sciense And Technology Science University Of Tokyo
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SAITO Tatsuyuki
Micro Device Division, Hitachi Ltd.
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Haba Toshio
Hitachi Research Laboratory Hitachi Ltd.
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Nagano Takahiro
Semiconductor And Integrated Circuits Division Hitachi Ltd.
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Chiba Masahiro
Hitachi Kyowa Engineering Ltd.
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TASHIRO Suguru
Department of Materials Science and Engineering, Ibaraki University
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ISHIKAWA Kensuke
Micro Device Division, Hitachi Ltd.
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NAGANO Takahiro
Intellexres Laboratory
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Saito Tatuyuki
Micro Device Division Hitachi Ltd.
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Tashiro Suguru
Department Of Materials Science And Engineering Ibaraki University
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Aoyama Takashi
Department Of Computational Science Kanazawa University
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Nagano Takahiro
Department of Materials Science and Engineering, Ibaraki University, Hitachi, Ibaraki 316-8511, Japan
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Aoyama Takashi
Department of Chemistry, Faculty of Science, The University of Tokyo
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Onuki Jin
Department Of Materials Science And Engineering Ibaraki University
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Koizumi M
Department Of Electronics And Information Systems Faculty Of Systems Science And Technology Akita Pr
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KOMIYAMA Takao
Department of Electronics and Information Systems, Faculty of Systems Science and Technology, Akita
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Komiyama Takao
Department Of Electronic And Information Systems Faculty Of Systems Science And Technology Akita Pre
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HABA Toshio
Hitachi Research Laboratory, Hitachi Ltd.
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ITABASHI Takeyuki
Advanced Research Laboratory, Hitachi Ltd.
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SAITO Tatuyuki
Hitachi, Ltd., Hitachi Device Development Center
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Onuki Jin
Department Of Materials Science Faculty Of Engineering Ibaraki University
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Itabashi Takeyuki
Advanced Research Laboratory Hitachi Ltd.
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Khoo Khyoupin
Department Of Materials Science Faculty Of Engineering Ibaraki University
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KUROSU Toshiki
Power and Industrial Division, Hitachi Ltd.
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NAKAMURA Yoshihide
Graduate School of Science and Engineering, Ibaraki University
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OZAKI Keisuke
Graduate School of Science and Engineering, Ibaraki University
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ISHIKAWA Nobuhiro
The National Institute for Materials Science
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Kurosu Toshiki
Power And Industrial Division Hitachi Ltd.
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Nakamura Yoshihide
Graduate School Of Science And Engineering Ibaraki University
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Ozaki Keisuke
Graduate School Of Science And Engineering Ibaraki University
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Khoo Khyoupin
Dep. Of Materials Sci. Fac. Of Engineering Ibaraki Univ.
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Haba Toshio
Hitachi Research Laboratory, Hitachi Ltd., Hitachi, Ibaraki 319-1292, Japan
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Haba Toshio
Hitachi Research Laboratory, Hitachi, Ltd., Hitachi, Ibaraki 319-1292, Japan
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Akahoshi Haruo
Hitachi Research Laboratory, Hitachi Ltd., Hitachi, Ibaraki 319-1292, Japan
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Khoo Khyoupin
Department of Materials Science and Engineering Ibaraki University, Hitachi, Ibaraki 316-8511, Japan
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Khoo Khyoupin
Department of Materials Science and Engineering, Ibaraki University, Hitachi, Ibaraki 316-8511, Japan
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Chonan Yasunori
Department of Electronics and Information System, Faculty of System Science and Technology, Akita Prefectural University
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Chonan Yasunori
Department of Electronics and Information System, Faculty of System Science and Technology, Akita Prefectural University, Honjyo, Akita 015-0055, Japan
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Ishikawa Kensuke
Micro Device Division, Hitachi, Ltd., Ome, Tokyo 198-8512, Japan
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Saito Tatsuyuki
Micro Device Division, Hitachi, Ltd., Ome, Tokyo 198-8512, Japan
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Chiba Masahiro
Hitachi Kyowa Engineering, Ltd., Hitachi, Ibaraki 319-1292, Japan
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AOYAMA Takashi
Department of Electronics and Information System, Faculty of System Science and Technology, Akita Prefectural University
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KHOC Khyoupin
Department of Materials Science and Engineering Ibaraki University
著作論文
- Influence on the Electro-Migration Resistance by Line Width and Average Grain Size along the Longitudinal Direction of Very Narrow Cu Wires
- Microstructures of 50-nm Cu Interconnects along the Longitudinal Direction
- Influence of Grain Size Distributions on the Resistivity of 80nm Wide Cu Interconnects
- Filling a Narrow and High Aspect-Ratio Trench with Electro-Cu Plating
- Reliability Enhancement of Thick Al-Cu Wire Bonds in IGBT Modules Using Al_2Cu Precipitates
- Aspect Ratio Dependence of the Resistivity of Fine Line Cu Interconnects
- Filling 80-nm-Wide and High-Aspect-Ratio Trench with Pulse Wave Copper Electroplating and Observation of the Microstructure
- Observation of Microstructures in the Longitudinal Direction of Very Narrow Cu Interconnects
- Influence of Minimum Barrier Metal Thickness at Trenches on Void Formation in 50-nm-wide Cu Wiring