Oyanagi H | Optoelectronics Division Electrotechnical Laboratory
スポンサーリンク
概要
関連著者
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OYANAGI Hiroyuki
National Institute for Advanced Industrial Science and Technology
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Oyanagi Hiroyuki
Optoelectronics Division Electrotechnical Laboratory
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Oyanagi H
Optoelectronics Division Electrotechnical Laboratory
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Oizumi H
Electrotechnical Laboratory
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Oyanagi Hiroyuki
Electrotechnical Laboratory
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Oyanagi Hiroyuki
Electrotech. Lab. Tsukuba
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OYANAGI Hiroyuki
Electrotech. Lab. , Tsukuba
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TOKUMOTO Madoka
Electrotechnical Laboratory
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Tokumoto Madoka
Electronics and Photonics Research Institute (EPRI), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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KIMURA Yoichi
Electrotechnical Laboratory
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Matsushita T
Osaka Sangyo Univ. Osaka Jpn
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IHARA Hideo
Electrotechnical Laboratory
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Matsushita Tadashi
National Laboratory For High Energy Physics
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MURATA Keizo
Electrotechnical Laboratory
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Murata Keizo
Osaka City University
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Murata K
Tokyo Medical And Dental Univ. Tokyo Jpn
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Murata Keizo
Electorotechnical Laboratory
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Yamaguchi H
Gunma Univ. Gunma
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Murata Kazuhiro
Department Of Physics Division Of Material Science Nagoya University
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Yamaguchi H
Electrotechnical Lab. Ibaraki Jpn
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Yamaguchi H
Inst. Physical And Chemical Res. (riken) Saitama
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Yamaguchi H
Akita Prefectual University
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Yamaguchi H
Ritsumeikan University
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YAO Takafumi
Electrotechnical Laboratory
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TERADA Norio
Electrotechnical Laboratory
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HIRABAYASHI Masayuki
Electrotechnical Laboratory
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Yamaguchi Hirotaka
Electrotechnical Laboratory
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Hirabayashi M
Electrotechnical Laboratory
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SAKAMOTO Keishi
Japan Atomic Energy Agency
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Yao Takafumi
Electrical Laboratory
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Yamaguchi Hirotaka
Electrotech. Lab. Tsukuba
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YAMAGUCHI Hirotaka
Electrotech. Lab. , Tsukuba
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NISHIHARA Yoshikazu
Electrotechnical Laboratory
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NISIHARA Yoshikazu
Tsukuba Reserch Center,SANYO Co.Ltd.,
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Obara Haruhiko
Electrotechnical Laboratory
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Nishihara Y
Electrotechnical Lab. Tsukuba
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Kuwahara Yuji
Department Of Material And Life Science Faculty Of Engineering Osaka University
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Kuwahara Yuji
The Institute Of Physical And Chemical Research
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OKA Kunihiko
Electrotechnical Laboratory
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SENZAKI Kiyoshi
Electrotechnical Laboratory
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SHIODA Ryu
Electrotechnical Laboratory
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Fujikawa Takayuki
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology:(present Address) Displa
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Tokumoto H
Electrotechnical Laboratory
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Oizumi Hiroaki
Faculty Of Engineering Yokohama National University
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Ito Toshimitsu
National Institute For Advanced Industrial Science And Technology
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ISHIGURO Takehiko
Electrotechnical Laboratory
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YAMASAKI Hirofumi
Electrotechnical Laboratory
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MATSUBARA Toshiya
Research Center, Asahi Glass Co., Lid.
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Bianconi A
Unita Infm And Dipartimento Di Fisica Universita Di Roma "la Sapienza
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Toyota N
Physics Department Graduate School Of Science Tohoku University
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Maruyama K
Faculty Of Science Niigata University
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Ito Toshimitsu
Electrotechnical Laboratory
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FUJIKAWA Takashi
Faculty of Engineering,Yokohama National University
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Kuroda H
Institute For Solid State Physics University Of Tokyo
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Saini N
Unita Infm And Dipartimento Di Fisica Universita Di Roma "la Sapienza
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SAKAMOTO Tsunenori
Electrotechnical Laboratory
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SAKAMOTO Kunihiro
Electrotechnical Laboratory
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Tokumoto Madoka
Electrotechnical Laboratory Sakura-mura Niihari-gun
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SAINI Naurang
Unita INFM and Dipartimento di Fisica, Universita di Roma "La Sapienza"
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Ishiguro Takehiko
Electrotechincal Laboratory
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Saini Naurang
Unita Infm And Dipartimento Di Fisica Universita Di Roma "la Sapienza
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Shioda R
Electrotechnical Laboratory
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Oka Kunihiko
National Institute For Advanced Industrial Science And Technology
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Kurai Hiroyuki
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Yamaguchi H
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Yamaguchi H
Ntt Basic Research Laboratories
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Tokumoto M
Nanotechnology Research Institute National Institute Of Advanced Industrial Science And Technology (
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Sakamoto T
Univ. Tokyo Tokyo
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Kobayashi Hayao
Crest-jst:department Of Chemistry College Of Humanities And Sciences Nihon University:institute For
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Ishiguro T
Nagaoka Univ. Technol. Nagaoka Jpn
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Fujikawa Takashi
Faculty Of Engineering Yokohama National University
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Matsubara Toshiya
Research Center Asahi Glass Co. Lid.
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Fujikawa Takashi
Faculty Of Agriculture Shizuoka University
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ITO Toshimitsu
National Institute of Advanced Industrial Science and Technology
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山田 晃
東京農工大学生物システム応用科学府
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Takeda Yoshikazu
Department Of Electrical Engineering Kyoto University:(present Address) Department Of Materials Nago
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Takeda Yoshikazu
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Fons P
Optoelectronic Materials And Devices Group Photonics Research Institute National Institute Of Advanc
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Tokumoto M
Electrotechnical Lab. Ibaraki
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Kuroda Haruo
Department of Chemistry, Faculty of Science, The University of Tokyo
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Scagnoli Valerio
Unita Infm And Dipartimento Di Fisica Universita Di Roma "la Sapienza
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Takeda Y
Department Of Chemistry Faculty Of Engineering Mie University
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Uosaki Kohei
Physical Chemistry Laboratory Division Of Chemistry Graduate School Of Science Hokkaido University
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Aono Masakazu
The Institute Of Physical And Chemical Research (riken)
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UNOKI Hiromi
Electrorechnical Laboratory
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Takeda Y
Nagoya Univ. Nagoya Jpn
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Unoki H
Electrotechnical Lab. Ibaraki
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Unoki H
Superconductivity Research Laboratory
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Unoki Hiromi
Electotechnical Laboratory
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KATAYAMA Toshikazu
Electrotechnical Laboratory
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Fons P
National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Takeda Yasuo
Department Of Chemistry Faculty Of Engineering Mie Univerisity
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IWASAKI Hiroshi
National Laboratory for High Energy Physics
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MATSUSHITA Tadashi
Electrotechnical Laboratory
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KAMEI Hidenori
Sumitomo Electric Industries, Ltd.
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Maruyama Kenji
Faculty Of Science Niigata University
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OKA Kunihiko
National Institute of Advanced Industrial Science and Technology
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Kondo T
Hokkaido Univ. Sapporo
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BIANCONI Antonio
Unita INFM and Dipartimento di Fisica, Universita di Roma "La Sapienza"
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Kuroda Haruo
Department Of Chemistry Faculty Of Science The University Of Tokyo
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Oka Kunihiko
Electotechnical Laboratory
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Niki S
Optoelectronic Materials And Devices Group Photonics Research Institute National Institute Of Advanc
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Kamei Hidenori
Sumitomo Electric Industries Ltd.
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Kondo T
Physical Chemistry Laboratory Division Of Chemistry Graduate School Of Science Hokkaido University
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Tamura Kazuhisa
Physical Chemistry Laboratory Division Of Chemistry Graduate School Of Science Hokkaido University
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Katayama T
Electrotechnical Laboratory
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Koinuma M
Physical Chemistry Laboratory Division Of Chemistry Graduate School Of Science Hokkaido University
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AONO Masakazu
The Institute of Physical and Chemical Research
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NAKANISHI Hisayuki
Faculty of Science and Technology, Science University of Tokyo
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Yokohama Yuko
Electrotechnical Laboratory
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Matsuhata H
Electrotechnical Lab. Ibaraki Jpn
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MATSUHATA Hirofumi
Electrotechnical Laboratory
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Shibata H
Toshiba Corp. Yokohama Jpn
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Ishiguro T
Kyoto Univ. Kyoto
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Uosaki Kohei
Phyical Chemistry Laboratory Division Of Chemistry Graduate School Of Science Hokkaido University
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Murata K
Department Of Material Science Graduate School Of Science Osaka City University
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Shibata Hajime
Electrotechnical Laboratory
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SHIRAKATA Sho
Faculty of Engineering Science, Osaka University
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NIKI Shigeru
Optoelectronics Division, Electrotechnical Laboratory
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YAMADA Akimasa
Optoelectronics Division, Electrotechnical Laboratory
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FONS Paul
Optoelectronics Division, Electrotechnical Laboratory
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FONS Paul
Electrotechnical Laboratory
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YAMADA Akimasa
Electrotechnical Laboratory
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NIKI Shigeru
Electrotechnical Laboratory
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MAKITA Yunosuke
Electrotechnical Laboratory
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Fons Paul
Optoelectronic Materials And Devices Group Photonics Research Institute National Institute Of Advanc
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KAJIMURA Koji
Electrotechnical Laboratory, Tsukuba Research Center
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OYANAGI Hiroyuki
Optoelectronics Division, Electrotechnical Laboratory
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ISOMURA Shigehiro
Faculty of Engineering Ehime University
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Murata K
Division Of Molecular Materials Science Graduate School Of Science Osaka City University
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KONDO Toshihiro
Physical Chemistry Laboratory, Division of Chemistry, Graduate School of Science, Hokkaido Universit
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Hasumi Yuichi
Faculty of Science & Technology, Meji University
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YAMAGICHI Hirotaka
Electrotechnical Laboratory
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NISHIHARA Toshikazu
Electrotechnical Laboratory
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TANOUE Hisao
Photon Factory, National Laboratory for High Energy Physics
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KOHRA Kazutake
Electrotechnical Laboratory
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SHIRAKAWA Hideki
Electrotechnical Laboratory
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NEMOTO Hiroaki
Electrotechnical Laboratory
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ITO Masahisa
Electrotechnical Laboratory
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KURODA Haruo
Electrotechnical Laboratory
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TWEET Douglas
Electrotechnical Laboratory
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Shibata H
Electrotechnical Lab. Ibaraki Jpn
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BlANCONl Antonio
Unita INFM and Dipartimento di Fisica, Universita di Roma "La Sapienza"
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Hasumi Yuichi
Faculty Of Science & Technology Meji University
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TANOUE Hisao
National Institute of Advanced Industrial Science and Technology (AIST)
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Blanconl Antonio
Unita Infm And Dipartimento Di Fisica Universita Di Roma "la Sapienza
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Shibata Hiroyuki
Ntt Basic Research Laboratories
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Shirakawa Hideki
Electrotechnical Laboratory:institute Of Materials Science University Of Tsukuba
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IRIE Taizo
Department of Electrical Engineering, Faculty of Engineering, Science University of Tokyo
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Usami S
Yokohama National Univ. Yokohama Jpn
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Usami Seiji
Faculty Of Engineering Yokohama National University
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Irie Taizo
Department Of Applied Electronics Faculty Of Industrial Science And Technology Science University Of
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Irie Taizo
Department Of Applied Electronics Tokyo University Of Science
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Makita Y
Marine Resources And Environment Institute National Institute Of Advanced Industrial Science And Tec
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Tanoue H
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Tanoue H
National Institute Of Advanced Industrial Science And Technology (aist)
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Ito Masahisa
Electrotechnical Laboratory:institute Of Physical And Chemical Research
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Kondo Toshihiro
Physical Chemistry Laboratory Division Of Chemistry Graduate School Of Science Hokkaido University
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Kondo Toshihiro
Physical Chemistry Laboratory Department Of Chemistry Faculty Of Science Hokkaido University
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Niki Shigeru
Optoelectronics Division Electrotechnical Laboratory
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Kajimura Koji
Electrotechnical Laboratory
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Shirakata Sho
Faculty Of Engineering Ehime University
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Nemoto H
Hitachi Ltd. Tokyo Jpn
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Nemoto H
Electrotechnical Laboratory:institute Of Materials Science University Of Tsukuba
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IIZUKA Junichi
Faculty of Engineering, Yokohama National University
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OHTA Toshiaki
National Laboratory for High Energy Physics
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Iizuka Junichi
Faculty Of Engineering Yokohama National University
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Uosaki Kohei
Physical Chemistry Laboratory Department Of Chemistry Faculty Of Science Hokkaido University
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ISHIGURO Takashi
Department of Electrical Engineering, Nagaoka University of Technology
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HAGA Koukichi
Sumitomo Electric Industries Ltd.
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TAMURA Kazuhisa
Physical Chemistry Laboratory, Division of Chemistry, Graduate School of Science, Hokkaido Universit
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KOINUMA Michio
Physical Chemistry Laboratory, Division of Chemistry, Graduate School of Science, Hokkaido Universit
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Nakanishi Hisayuki
Faculty Of Science And Technology Tokyo University Of Science
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Nakanishi Hisayuki
Faculty Of Science And Engineering Science University Of Tokyo
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NAKAGAWA Yoshihiko
Electrotechnical Laboratory
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KIMURA Yoichi
JElectrotechnical Laboratory
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ISHIHARA Takeshi
JJapan Fine Ceramics Center
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Bianconi A
Univ. Rome “la Sapienza"
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Tanoue Hisao
Photon Factory National Laboratory For High Energy Physics
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Uosaki Kohei
National Institute For Materials Science (nims)
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ISOMURA Shigehiro
Faculty of Engineering , Ehime University
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Makita Yoji
Marine Resources and Environment Institute, National Institute of Advanced Industrial Science and Technology (AIST)
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Yamada Akimasa
Optoelectronic Materials and Devices Group, Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Niki Shigeru
Optoelectronic Materials and Devices Group, Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
著作論文
- Translational Phase Domains in the Cation Sublattice of Chalcopyrite Compounds
- Electron Probe Microanalysis of Second Phases via Acceleration Voltage Dependence
- Effect of Reduction on Superconductivity and Electronic State of Nd-Ce-Cu-O System
- X-Ray Absorption Near-Edge Studies of La_Sr_xCuO_
- Mossbauer and Magnetization Study of YBa_2(Cu_Fe_x)_3O_
- Polarized X-Ray Absorption Fine Structure of La_2CuO_Single Crystal
- X-Ray Absorption Fine Structure Studies of Fe-Doped Ba_2YCu_3O_y
- Si/Ge/Si Monolayer Heterostructure on Si(100) Studied by Surface-Sensitive EXAFS
- Superconductivity, Structure and Oxygen Count of Fe-Doped Ba_2YCu_3O_y : Electrical Properties of Condensed Matter
- Evidence of Critical Oxygen Concentration at y=6.7〜6.8 for 90 K Superconductivity in Ba_2YCu_3O_y
- Valence Study of Orthorhombic and Tetragonal Ba_2YCu_3O_y : The Role of Oxygen Vacancies in High-T_c Superconductivity
- Local Structure in Orthorhombie and Tetragonal Ba_2YCu_3O_ : The Role of Oxygen Vacancies for High T_c Superconductivity
- Short Range Order in High T_c Superconductors Ba_xY_CuO_ and Sr_xLa_CuO_
- Valence and Coordination of Cu Ions in High T_c Superconductor Ba_xY_CuO_
- X-Ray Absorption Spectra of High T_c Superconducting Sr_xLa_CuO_
- Short-Range Order Full Multiple Scattering Approach to the Polarized K-Edge XANES of Br Doped in Trans-Polyacetylene
- Short-Range Order Full Multiple Scattering Approach to the Polarized L_1-Edge XANES of Iodine Doped in Trans-Polyacetylene
- Fluorescence-Detected X-Ray Absorption Spectroscopy Applied to Structural Characterization of Very Thin Films;Ion-Beam-Induced Modification of Thin Ni Layers on Si(100)
- Polarized X-Ray Absorption Spectra of Bromine-Doped Polyacetylene;Evidence for Highly-Oriented Polybromine Ions
- Strain Effects on Interdiffusion in InAs_P_x/InP Heterostructures
- Study of Temperature Dependent Local Structure by Polarized Cu K-edge EXAFS Measurements on La_Sr_xCuO_4 (x = 0.105, 0.13, 0.20)
- Study of Temperature Dependent Local Structure by Polarized Cu K-edge EXAFS Measurements on La_Sr_xCuO_4 (x=0.105, 0.13, 0.20)
- X-Ray Diffraction Study on Single Crystal of La_Ba_CuO_4
- Evidence for Critical Lattice Fluctuations in the High T_c Cuprates
- Bond Length Relaxation in Ultrathin InAs and InP_As_ Layers on InP(001)
- Local Structure of CuInSe_2 Thin Film Studied by EXAFS
- EXAFS Studies on (Cu, In)Se_2
- K-Edge XANES of GaP, InP and GaSb
- Incorporation Process of the As Atom on the InP(001) Surface Studied by Extended X-Ray Absorption Fine Structure
- Ge Epitaxial Overlayers on Si(001) Studied by Surface-Sensitive X-Ray Absorption Fine Structure: Evidence for Strain-Induced Surface Rearrangement
- Heterointerfaces in Strained-Layer Superlattices Studied by Surface-Sensitive XAFS
- Coverage Dependent Structure of Electrochemically Deposited Cu on p-GaAs(100) in H_2SO_4 Solution Determined by In Situ Surface X-Ray Absorption Fine Structure Spectra
- Superconducting Properties of Grain-Oriented Samples of Y_1Ba_2Cu_3O_y
- Temperature and Magnetic Field Dependence of the Critical Current in Polycrystalline Ba_2YCu_3O_y : Electrical Properties Condensed Matter
- Copper Nanoclusters Electrochemically Deposited on p-GaAs(100) in H2SO4 Solution Probed by Surface-Sensitive XAFS