FONS Paul | Electrotechnical Laboratory
スポンサーリンク
概要
関連著者
-
FONS Paul
Electrotechnical Laboratory
-
YAMADA Akimasa
Electrotechnical Laboratory
-
山田 晃
東京農工大学生物システム応用科学府
-
Fons P
Optoelectronic Materials And Devices Group Photonics Research Institute National Institute Of Advanc
-
NIKI Shigeru
Electrotechnical Laboratory
-
Fons P
National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
-
Shibata H
Toshiba Corp. Yokohama Jpn
-
Shibata Hajime
Electrotechnical Laboratory
-
IWATA Kakuya
Electrotechnical Laboratory
-
MATSUBARA Koji
Electrotechnical Laboratory
-
HUNGER Ralf
Electrotechnical Laboratory
-
Shibata H
Electrotechnical Lab. Ibaraki Jpn
-
Shibata Hiroyuki
Ntt Basic Research Laboratories
-
Niki S
Optoelectronic Materials And Devices Group Photonics Research Institute National Institute Of Advanc
-
Tanabe Tetsuhiro
Optical Device R&D Division, R0HM Corp., Ltd., 21 Mizosaki-cho, Saiin, Ukyo-ku, Kyoto 615-8585, Japan
-
Takasu Hidemi
Optical Device R&D Division, R0HM Corp., Ltd., 21 Mizosaki-cho, Saiin, Ukyo-ku, Kyoto 615-8585, Japan
-
Nakahara Ken
Optical Device R&D Division, R0HM Corp., Ltd., 21 Mizosaki-cho, Saiin, Ukyo-ku, Kyoto 615-8585, Japan
-
Oizumi H
Electrotechnical Laboratory
-
Oyanagi Hiroyuki
Electrotechnical Laboratory
-
Matsubara Kazuo
Kobelco Research Institute Inc.
-
山田 晃
東京農工大学生物システム応用科学研究科
-
KIMURA Shinji
Electrotechnical Laboratory
-
OBARA Akira
Electrotechnical Laboratory
-
KOBAYASHI Naoto
Electrotechnical Laboratory
-
MAKITA Yunosuke
Electrotechnical Laboratory
-
TANABE Tetsuhiro
Optical Device Research and Development Division, Rohm Company Limited
-
Fons Paul
Optoelectronic Materials And Devices Group Photonics Research Institute National Institute Of Advanc
-
NAKAHARA Ken
Optical Devices R&D Center, ROHM Co., Ltd.
-
TAKASU Hidemi
Optical Devices R&D Center, ROHM Co., Ltd.
-
Nakahara Ken
Interdisciplinary Devices R&d Center Rohm Co. Ltd.
-
Takasu Hidemi
Device Technology Div. Semiconductor Research And Development Headquarters Rohm Co. Ltd.
-
OYANAGI Hiroyuki
National Institute for Advanced Industrial Science and Technology
-
Oyanagi Hiroyuki
Optoelectronics Division Electrotechnical Laboratory
-
Takasu Hidemi
Advanced Compound Semiconductors R&d Center Rohm Co. Ltd.
-
Makita Y
Marine Resources And Environment Institute National Institute Of Advanced Industrial Science And Tec
-
Iwata K
Optoelectronic Materials And Devices Group Photonics Research Institute National Institute Of Advanc
-
Tanabe Takaya
Advanced Compound Semiconductors R&d Center Rohm Co. Ltd.
-
Matsubara K
Optoelectronic Materials And Devices Group Photonics Research Institute National Institute Of Advanc
-
Matsubara Koji
Kansai Advanced Research Center Communications Research Laboratory
-
Nakahara Ken
Advanced Compound Semiconductors R&d Center Rohm Co. Ltd.
-
BOTTOMLEY David
Electrotechnical Laboratory
-
Oyanagi H
Optoelectronics Division Electrotechnical Laboratory
-
Oyanagi Hiroyuki
Electrotech. Lab. Tsukuba
-
Tanabe Tetsuhiro
Advanced Compound Semiconductors R&d Center Rohm Co. Ltd.
-
Tanabe Tetsuhiro
Optical Device Research And Development Division Rohm Company Limited
-
Makita Yoji
Marine Resources and Environment Institute, National Institute of Advanced Industrial Science and Technology (AIST)
-
Nakahara Ken
Optical Devices R&D Center, ROHM Co., Ltd., 21 Saiin Mizosaki-cho, Ukyo-ku, Kyoto 615-8585, Japan
-
Takasu Hidemi
Optical Devices R&D Center, ROHM Co., Ltd., 21 Saiin Mizosaki-cho, Ukyo-ku, Kyoto 615-8585, Japan
-
Fons Paul
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Yamada Akimasa
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Iwata Kakuya
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Niki Shigeru
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Hunger Ralf
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
OYANAGI Hiroyuki
Electrotech. Lab. , Tsukuba
著作論文
- Deposition of Ge_C_x Alloy on Si by Combined Low-Energy Ion Beam and Molecular Beam Epitaxial Method
- Translational Phase Domains in the Cation Sublattice of Chalcopyrite Compounds
- Growth of Undoped ZnO Films with Improved Electrical Properties by Radical Source Molecular Beam Epitaxy
- The Strain Energy Densities of Hexagonal and Tetragonal Epitaxial Media
- Growth of Undoped ZnO Films with Improved Electrical Properties by Radical Source Molecular Beam Epitaxy