Choi Yang-kyu | Dept. Of Eecs Korea Advanced Institute Of Science And Technology
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概要
関連著者
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Choi Yang-kyu
Dept. Of Eecs Korea Advanced Institute Of Science And Technology
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Choi Yang
Dept. Of Eecs Korea Advanced Institute Of Science And Technology
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Choi Yang
Dept. Of Eecs Kaist
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Choi Yang-kyu
Electrical Eng. Dept. Nanobioelectronic Lab. Korean Advanced Inst. Of Science And Technology
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Kim Kuk-hwan
Dept. Of Eecs Korea Advanced Institute Of Science And Technology
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Han Jin-woo
Dept. Of Eecs Korea Advanced Institute Of Science And Technology
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Ryu Seong
Dept. of EECS, Korea Advanced Institute of Science and Technology
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Ryu Seong
Dept. Of Eecs Kaist
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Ryu Seong-Wan
Dept. of EECS, KAIST
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Kim Kuk-Hwan
Dept. of EECS, Korea Advanced Institute of Science and Technology
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LEE Hyunjin
Dept. of EECS, Korea Advanced Institute of Science and Technology
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Kim Kuk
Dept. Of Eecs Korea Advanced Institute Of Science And Technology
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Lee Hyunjin
Dept. Of Eecs Korea Advanced Institute Of Science And Technology
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Kang Hyun
Dept. Of Eecs Kaist
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Kim Kuk
Dept. of EECS, Korea Advanced Institute of Science and Technology
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Ku Cheon
Dept. of EECS, Korea Advanced Institute of Science and Technology
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PARK Donggun
Device Research Team, R&D Center, Samsung Electronics Co.
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Ku Cheon
Dept. Of Eecs Korea Advanced Institute Of Science And Technology
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Ryu Seong
Dept. Of Eecs Korea Advanced Institute Of Science And Technology
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Park Donggun
Device Research Team Semiconductor R&d Division Samsung Electronics Co.
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Park Donggun
Device Research Team
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Ku Cheon-Hak
Dept. of EECS, Korea Advanced Institute of Science and Technology
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Ryu Seong-Wan
Dept. of EECS, Korea Advanced Institute of Science and Technology
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Han Jin-Woo
Dept. of EECS, Korea Advanced Institute of Science and Technology
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Choi Yang-Kyu
Dept. of EECS, Korea Advanced Institute of Science and Technology
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Kang Hyun-Sik
Dept. of EECS, KAIST
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LEE Choong-Ho
Device Research Team, R&D Center, Samsung Electronics
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Lee Choong-ho
Device Research Team R&d Center Samsung Electronics
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Lee Choong-ho
Device Research Team Semiconductor R&d Division Samsung Electronics Co.
著作論文
- Investigation of Gate Misalignment Effects in FinFETs(Session 7A Silicon Devices IV,AWAD2006)
- Investigation of Gate Misalignment Effects in FinFETs(Session 7A Silicon Devices IV,AWAD2006)
- Novel Structures for a 2-Bit per Cell of Nonvolatile Memory Using an Asymmetric Double Gate(Si Devices and Processes,Fundamental and Application of Advanced Semiconductor Devices)
- Novel Structures for 2-Bit Per Cell of NVM Using Asymmetric Double Gate (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- Novel Structures for 2-Bit Per Cell of NVM Using Asymmetric Double Gate (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- A Compact Modeling of Threshold Voltage Shift by a Quantum Confinement Effect in UTB MOSFET (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- A Compact Modeling of Threshold Voltage Shift by a Quantum Confinement Effect in UTB MOSFET (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- A Comprehensive Study of Punchthrough Characteristics in Multiple-Gate MOSFETs--The Trend of Punchthrough Voltages in Various Gate Shapes of SOI MOSFETs (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- A Comprehensive Study of Punchthrough Characteristics in Multiple-Gate MOSFETs--The Trend of Punchthrough Voltages in Various Gate Shapes of SOI MOSFETs (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- A Comprehensive Study of Hot-Carrier Effects in Body-Tied FinFETs
- A Comprehensive Study of Hot-Carrier Behaviors with Consideration of Non-Local, Series Resistance, Quantum, and Temperature Effects in Multi-Gate FinFETs