Selective Single-Crystalline-Silicon Growth at the Pre-defined Active Region of a Thin Film Transistor on Glass by Using Continuous Wave Laser Irradiation
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2003-01-15
著者
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Sasaki Nobuo
Fujitsu Laboratories Limited
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HARA Akito
Fujitsu Laboratories Limited
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YOSHINO Kenichi
Fujitsu Laboratories Limited
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TAKEUCHI Fumiyo
Fujitsu Laboratories Limited
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Sasaki N
Fujitsu Laboratories Ltd.
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- Selective Single-Crystalline-Silicon Growth at the Pre-defined Active Region of a Thin Film Transistor on Glass by Using Continuous Wave Laser Irradiation
- Self-Aligned Metal Double-Gate Low-Temperature Polycrystalline Silicon Thin-Film Transistors on Non-Alkali Glass Substrate Using Diode-Pumped Solid-State Continuous Wave Laser Lateral Crystallization