Field Emission from Modified P-Doped Diamond Surfaces with Different Barrier Heights
スポンサーリンク
概要
- 論文の詳細を見る
In this study, the field emission properties of P-doped diamond with various surface treatments were measured in order to understand the effects of surface treatments on the barrier height. The emission properties were acquired for diamond with C-reconstructed, oxidized, and H-plasma treated surfaces. The voltage drop across the vacuum was estimated for each surface, using threshold voltage–anode distance ($V$–$d$) measurement. The estimated electric fields near the diamond surface were 4.95, 26.6, and 54.1 V/μm for the C-reconstructed, oxidized, and H-plasma treated surfaces, respectively. The barrier height ratio of these surfaces derived from their electric fields was $1:3.1:4.9$, which agrees with the result derived from Fowler–Nordheim (F–N) plots. Considering the electron affinities of all surfaces and the obtained results, positive electron affinities dominate the field emission properties of the C-reconstructed and oxidized surfaces. An internal barrier due to upward band bending on the H-plasma treated surface limits the field emission properties, even though it has a negative electron affinity. Our results suggest that the emission properties strongly depend on the barrier height, which is modified by surface treatment.
- 2008-12-25
著者
-
NEBEL Christoph
Fraunhofer Institute for Applied Solid State Physics
-
Kudo Yuki
Department Of Applied Chemistry Graduate School Of Urban Environmental Sciences Tokyo Metropolitan U
-
Yamada Takatoshi
Diamond Research Center Advanced Industrial Science And Technology
-
Okano Ken
Department Of Electronic & Photonics System Engineering Kouchi University Of Technology
-
SAITO Ichitaro
Department of Engineering, University of Cambridge
-
Shikata Shin-ichi
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
-
Yamaguchi Hisato
Department Of Physics International Christian University
-
Masuzawa Tomoaki
Department of Physics, International Christian University (ICU), 3-10-2 Osawa, Mitaka, Tokyo 181-8585, Japan
-
Yamada Takatoshi
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Okano Ken
Department of Physics, International Christian University (ICU), 3-10-2 Osawa, Mitaka, Tokyo 181-8585, Japan
-
Nebel Christoph
Fraunhofer Institute of Applied Solid State Physics, Freiburg 79108, Germany
-
Kudo Yuki
Department of Physics, International Christian University (ICU), 3-10-2 Osawa, Mitaka, Tokyo 181-8585, Japan
-
Yamaguchi Hisato
Department of Physics, International Christian University (ICU), 3-10-2 Osawa, Mitaka, Tokyo 181-8585, Japan
-
Saito Ichitaro
Department of Physics, International Christian University (ICU), 3-10-2 Osawa, Mitaka, Tokyo 181-8585, Japan
-
Shikata Shin-ichi
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
関連論文
- Synthesis and Surface Acoustic Wave Property of Aluminum Nitride Thin Films Fabricated on Silicon and Diamond Substrates Using the Sputtering Method : Surfaces, Interfaces, and Films
- 負の電子親和力を有するn型半導体ダイヤモンドからの電界電子放出機構(電子管と真空ナノエレクトロニクス及びその評価技術)
- Checkpoint Kinase 1 Is Cleaved in a Caspase-Dependent Pathway during Genotoxic Stress-Induced Apoptosis(Molecular and Cell Biology)
- Preparation of Two-dimensionally Ordered Microbeads Structure Dispensed with an Ink-jet and Its Application to ELISA
- Rapid ELISA in Droplet on PDMS Dimple with Nanoliter Reagents Dispensed by Ink-jet Microchip
- Development of a Surface-Reaction System in a Nanoliter Droplet Made by an Ink-jet Microchip
- Effect of Oxygen Coverage on Electron Emission from Boron-Doped Polycrystalline Diamond : Surfaces, Interfaces, and Films
- Synthesis of Diamond Thin Films Having Semiconductive Properties : Surfaces, Interfaces and Films
- Fabrication of Metal-Insulator-Semiconductor Devices Using Polycrystalline Diamond Film
- Estimation of the Emission Barrier Height of p-Type Semiconducting Diamond from its Field Emission Property
- Diamond Tip Arrays for Parallel Lithography and Data Storage
- Junction Properties of Polycrystalline Diamond / Hydrogenated Amorphous Silicon p-n Heterojunctions
- Polycrystalline Diamond/Hydrogenated Amorphous Silicon P-N Heterojunction
- Fabrication of 1 Inch Mosaic Crystal Diamond Wafers
- Anneal-Induced Degradation of Amorphous Selenium Characterized by Photoconductivity Measurements
- Diode- and Triode-structure amorphous selenium photodetectors driven by diamond cold cathode
- Model of Reactive Microwave Plasma Discharge for Growth of Single-Crystal Diamond
- Thermally Stable Schottky Barrier Diode by Ru/Diamond
- Fabrication of Single Crystalline Diamond Triode Electron Emitter
- Characterization of Field Emission from Nano-Scale Diamond Tip Arrays
- 2P502 Surface modification of diamond to prevent nonspecific protein adsorption toward the selective immobilization of target biomolecules(51. New methods and tools (II),Poster Session,Abstract,Meeting Program of EABS & BSJ 2006)
- Field Emission from Modified P-Doped Diamond Surfaces with Different Barrier Heights
- n型半導体立方晶窒化ホウ素単結晶からの電界電子放出機構(電子管と真空ナノエレクトロニクス及びその評価技術)
- Core Level Photoelectron Spectroscopic Study on Oxidized Phosphorus-Doped (100) Diamond Surfaces after Vacuum Annealing
- Anneal-Induced Degradation of Amorphous Selenium Characterized by Photoconductivity Measurements
- 1 \Omega On-Resistance Diamond Vertical-Schottky Barrier Diode Operated at 250 °C
- Qualitative Correspondences of Experimentally Obtained Growth Rates and Morphology of Single-Crystal Diamond with Numerical Predictions of Plasma and Gas Dynamics in Microwave Discharges for Various Substrate Holder Shapes
- Characterization of Boron-Doped Diamond Film
- 1Ω On-Resistance Diamond Vertical-Schottky Barrier Diode Operated at 250℃