Highly Efficient, Large-Area Polycrystalline Silicon Solar Cells Fabricated Using Hydrogen Passivation Technology

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概要

• 論文の詳細を見る

• Highly efficient, large area polycrystalline silicon solar cells have been fabricated using ion implantation as a hydrogen passivation technique. A new high-current ion implanter with a bucket-type ion source has been developed to hydrogenate crystal defects in cast polycrystalline cells. Effective hydrogen passivation of the defects has been realized by implanting hydrogen ions into cast cells from the back surfaces and increasing the hydrogen ion energy and dose. A scanning light beam-induced current image of the polycrystalline cells shows that lowering of the induced current distribution at linear grain boundaries is almost completely eliminated, but not at irregular grain boundaries. The resultant polycrystalline cells exhibit a high conversion efficiency of 15.2% for a large area of 100 cm2.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 1989-02-20

著者

• SHIMOKAWA Ryuichi

  Electrotechnical Laboratory

• Yagi Hideyuki

  Hitachi Research Laboratory Hitachi Lid.

• MATSUKUMA Kunihiro

  Hitachi Works of Hitachi Ltd.

• Saitoh Tadashi

  Central Research Laboraotry

• Shimokawa Ryuichi

  Electrotechnical Laboratory, Tsukuba, Ibaraki 305

• Kokunai Sigeru

  Hitachi Works, Hitachi, Ltd., Hitachi, Ibaraki 317

• Uchida Yasuaki

  Hitachi Works, Hitachi, Ltd., Hitachi, Ibaraki 317

• Suzuki Satoru

  Hitachi Works, Hitachi, Ltd., Hitachi, Ibaraki 317

• Saegusa Yukoh

  Hitachi Works, Hitachi, Ltd., Hitachi, Ibaraki 317

• Nishinoiri Kazuo

  Hitachi Works, Hitachi, Ltd., Hitachi, Ibaraki 317

• Morita Keiichi

  Kumamoto Institute of Technology, Ikeda, Kumamoto 860

• Yagi Hideyuki

  Hitachi Works, Hitachi, Ltd., Hitachi, Ibaraki 317

• Matsukuma Kunihiro

  Hitachi Works, Hitachi, Ltd., Hitachi, Ibaraki 317

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