Electrical Conduction of Silicon Nitride Films Deposited by SiH_4-NH_3 Reaction

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1976-06-05

著者

• Misawa Yutaka

  Hitachi Research Laboratory Hitachi Ltd.

• Misawa Yutaka

  Hitachi Research Laboratory Hitachi Lid.

• YAGI Hideyuki

  Hitachi Research Laboratory, Hitachi Lid.

• Yagi Hideyuki

  Hitachi Research Laboratory Hitachi Lid.

関連論文

• Electrical Conduction of Silicon Nitride Films Deposited by SiH_4-NH_3 Reaction
• Electrical and Mechanical Properties of Silicon Nitride Films Deposited by the SiCl_4-NH_3 Reaction
• Cracks in Silicon Dioxide-Phosphosilicate Glass-Silicon Nitride Composite Layer on Silicon Substrates
• Dislocations and Tungsten Concerntration Profiles in Tungsten-Silicon Contact Areas
• Highly Efficient, Large-Area Polycrystalline Silicon Solar Cells Fabricated Using Hydrogen Passivation Technology

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