Nanoscale Dots Fabrication by Volume Change Thermal Lithography
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概要
- 論文の詳細を見る
We have developed a novel lithography technique, called the “volume-change thermal-lithography”, for fabricating minute dots in less than 100 nm diameter. The combination of the temperature distribution induced by a focused laser beam with a Gaussian distribution and a specially designed multilayer, which consists of TbFeCo and ZnS-SiO2 films, enabled us to produce minute dots. Using a laser beam with a 405 nm wavelength, we succeeded in fabricating dots whose pitch and size are far beyond the optical diffraction limit. Furthermore, we delineated letters of approximately 1 μm size by dot arrangement for showing the high potential for more complicate fabrication using the technique.
- 2004-08-15
著者
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Kuwahara Masashi
Center For Applied Near-field Optics Research (can-for) Aist
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Kim Jooho
Digital Media R&d Center Samsung Electronics Co. Ltd.
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Yoon Duseop
Digital Media R&d Center Samsung Electronics Co. Ltd
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Yoon Duseop
Digital Media R&D Center, Samsung Electronics Co., Ltd., 416 Maetan-3Dong, Paldal-Gu, Suwon City, Kyungki-Do 442-742, Korea
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Tominaga Junji
Center for Applied Near Field Optics Research (CAN-FOR), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8562, Japan
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Kuwahara Masashi
Center for Applied Near-Field Optics Research (CAN-FOR), National Institute of Advanced Industrial Science and Technology (AIST), Central 4, 1-1-1 Higashi, Tsukuba 305-8562, Japan
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