Critical Thickness of Antiferromagnetic Layer in Exchange Biasing Bilayer System(Condensed matter: structure and mechanical and thermal properties)
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概要
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The exchange bias between the ferromagnetic (FM) and antiferromagnetic (AFM) bilayer was investigated within the framework of the classical Heisenberg model. The dependence of the exchange bias on the AFM layer thickness was also calculated by using the Landau-Lifshitz-Gilbert equation. The triple-Q (3Q), AF-I and T1 spin structures are obtained in the disordered γ-phase, ordered L1_0-, and L1_2- type lattices, respectively. The exchange bias is caused by the formation of the interfacial domain wall in the AFM layer, and the critical thickness d_c of AFM layer is dominated by the varied spin structures. Under the condition where the magnetic anisotropy energy is fixed to equivalent values in different alloys, the critical thickness d^<3Q>_c of the disordered γ-phase layer with the 3Q spin structure is thinner than that d^<AD-I>_c of the ordered L1_0-type layer with the AF-I spin structure. Also, the critical thickness d^<T1>_c is thinner than d^<AF-I>_c in ordered L1_2- and L1_0-type alloys. The relation among the critical thicknesses is dominated by the formation of a magnetic domain wall in the AFM layer. Consequently, the relation of the critical thickness can be represented as √<3d^<3Q>_c>=√<2d^<T1>_c=d^<AF-I>_c.
- 社団法人日本物理学会の論文
- 2008-04-15
著者
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TSUNODA Masakiyo
Department of Electronic Engineering, Tohoku University
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Tsunoda Masakiyo
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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SAKUMA Akimasa
Department of Applied Physics, Graduate School of Engineering, Tohoku University
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Sakuma Akimasa
Department Of Applied Physics Graduate School Of Engineering Tohoku University
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FUKAMICHI Kazuaki
Institute for Materials Research,Tohoku University
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TAKAHASHI Migaku
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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Fukamichi Kazuaki
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Fukamichi Kazuaki
Institute For Materials Research Tohoku University
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Mitsumata Chiharu
Advanced Electronics Research Laboratory Hitachi Metals Ltd.
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Sakuma Akimasa
Department Of Applied Physics Tohoku University
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Takahashi Migaku
Department Of Electronic Engineering Tohoku University
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Sakuma Akimasa
Tohoku Univ. Sendai Jpn
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Takahashi Migaku
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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