Optical Absorption Measurements of Sputtered Titanium Ions in RF Magnetron Sputtering (Short Note)
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概要
- 論文の詳細を見る
Optical absorption measurements of sputtered titanium (Ti) ions were performed during rf magnetron sputtering. A wavelength of 336.12nm (z^4G^○_<9/2>→a^4<F>_<7/2>) was used as the absorption line based on assignments of emission spectra for Ti ion (Ti II). We present variations of line-integrated absorption in terms of optical thickness against applied rf power for Ar sputtering at a pressure of 3.5Pa. Ratios of absorption of Ti II to that of Ti atoms (Ti I), which are representative of the ionization degree of sputtered Ti atoms, are also shown. [DOI: 10.1143/JJAP.41.1564]
- 社団法人応用物理学会の論文
- 2002-03-15
著者
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OKIMURA Kunio
Department of Electronics, Tokai University
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Nakamura Tadashi
Department Of Anesthesia Junwakai Memorial Hospital
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Okimura Kunio
Department Of Electronics Tokai University
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Nakamura Tadashi
Department Of Electronics Tokai University
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Okimura Kunio
Department of Electrical and Electronic Engineering, Tokai University, Hiratsuka, Kanagawa 259-1292, Japan
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