Okimura Kunio | Department of Electrical and Electronic Engineering, Tokai University, Hiratsuka, Kanagawa 259-1292, Japan
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概要
- Okimura Kunioの詳細を見る
- 同名の論文著者
- Department of Electrical and Electronic Engineering, Tokai University, Hiratsuka, Kanagawa 259-1292, Japanの論文著者
関連著者
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Okimura Kunio
Department of Electrical and Electronic Engineering, Tokai University, Hiratsuka, Kanagawa 259-1292, Japan
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Okimura Kunio
Department Of Electronics Tokai University
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FURUMI Takahiro
Department of Electronics, Tokai University
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Nakamura Tadashi
Department Of Anesthesia Junwakai Memorial Hospital
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Sakai Joe
Laboratoire d'Électrodynamique des Matériaux Avancés (LEMA), UMR 6157 CNRS/CEA, Université François Rabelais, Parc de Grandmont 37200 Tours, France
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Sasakawa Yusuke
Department of Information Telecommunication and Electronics, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan
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Sakai Joe
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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OKIMURA Kunio
Department of Electronics, Tokai University
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Okimura K
Tokai Univ. Kanagawa Jpn
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Shibata Akira
Department Of Applied Chemistry School Of Science And Engineering Kinki University
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Yamamoto Yukio
Department Of Agricultural Chemistry Faculty Of Agriculture Nagoya University
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MATUBARA Kakuei
Department of Electrical and Electronic Engineering, Yamaguchi University
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Yamamoto Yukio
Department Of Electrical Engineering Fukui National College Of Technology
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Shibata Akira
Department Of Electrical Engineering Fukui National College Of Technology
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Matubara K
Yamaguchi Univ. Ube Jpn
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Nakamura Tadashi
Department Of Electronics Tokai University
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Suzuki Yasushi
Department Of Agricultural Chemistry The University Of Tokyo
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Sakai Joe
Laboratoire d'Electrodynamique des Materiaux Avances (LEMA), UMR 6157 CNRS/CEA, Universite Francois Rabelais, Parc de Grandmont 37200 Tours, France
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Sakai Joe
School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
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Ezreena Nurul
Department of Information Telecommunication and Electronics, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan
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Shibata Akira
Department 1st Internal Medicine, Niigata University School of Medicine
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Furumi Takahiro
Department of Electronics, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan
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Hojo Mika
Department of Information Telecommunication and Electronics, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan
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Suzuki Yasushi
Department of Electrical and Electronic Engineering, Tokai University, Hiratsuka, Kanagawa 259-1292, Japan
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Okimura Kunio
Department of Electronics, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan
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Nihei Yusuke
Department of Information Telecommunication and Electronics, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan
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Yamauchi Kumiko
Department of Electronics, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan
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Kubo Naotaka
Department of Electronics, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan
著作論文
- X-ray Diffraction Study of Electric Field-Induced Metal–Insulator Transition of Vanadium Dioxide Film on Sapphire Substrate
- Effect of Heating Probe on Reactively Sputtered TiO_2 Film Growth
- Optical Absorption Measurements of Sputtered Titanium Ions in RF Magnetron Sputtering (Short Note)
- Time-dependent Characteristics of Electric Field-induced Metal–Insulator Transition of Planer VO2/c-Al2O3 Structure
- Preparation of VO2 Films with Metal–Insulator Transition on Sapphire and Silicon Substrates by Inductively Coupled Plasma-Assisted Sputtering
- Electric-Field-Induced Multistep Resistance Switching in Planar VO2/$c$-Al2O3 Structure
- Changes in Lattice Parameters of VO2 Films Grown on $c$-Plane Al2O3 Substrates across Metal–Insulator Transition
- Epitaxial Growth of V2O3 Thin Films on c-Plane Al2O3 in Reactive Sputtering and Its Transformation to VO2 Films by Post Annealing
- In-Plane Orientation and Annealing Behavior of Rutile TiO2 Films on MgO Substrate Prepared by Inductively Coupled Plasma-Assisted Sputtering
- Growth of Highly Oriented CoCrTa films by Inductively Coupled Plasma-Assisted Sputtering
- Ion Densities and Ionization Fractions of Sputtered Titanium in Inductively Coupled Plasma Assisted Sputtering
- Effect of Annealing with Ar Plasma Irradiation for Transparent Conductive Nb-Doped TiO2 Films on Glass Substrate
- Epitaxial Growth of Rutile TiO2 Films on MgO Substrate in Inductively Coupled Plasma-Assisted Sputtering