Effect of Hydrogen Plasma Treatment on Formation of Amorphous Silicon Film Using Organosoluble Silicon Cluster as a Precursor

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-10-01

著者

• Watanabe Akio

  Ntional Institute Of Advanced Industrial Science And Technology

• WATANABE Akira

  Institute for Chemical Reaction Science, Tohoku University

• Miwa Tetsuya

  Protein Array Project Erato Jrdc

• UNNO Masashi

  Institute for Multidisciplinary Research for Advanced Materials, Tohoku University

• MIWA Takao

  Hitachi Research Laboratory, Hitachi, Ltd.

• Watanabe Akiko

  The Institute For Solid State Physics The University Of Tokyo

• Miwa Takao

  Hitachi Research Laboratory Hitachi Ltd.

• Unno Masashi

  Institute Of Multidisciplinary Research For Advanced Materials Tohoku University

• Unno Masashi

  Institute For Multidisciplinary Research For Advanced Materials Tohoku University

• Watanabe A

  Institute Of Multidisciplinary Research For Advanced Materials Tohoku University

• HOJO Fusao

  Hitachi Research Laboratory, Hitachi Ltd.

• Hojo Fusao

  Hitachi Research Laboratory Hitachi Ltd.

• Watanabe Akiyoshi

  College Of General Education Tohoku University

• Watanabe Akira

  Institute For Chemical Reaction Science Tohoku University

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