Micropattern of Inorganic Film Prepared by UV-Irradiation and Heat Treatment of Polyalkylsilyne Film
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概要
- 論文の詳細を見る
A micropattern of inorganic thin film was formed by heat treatment of a polyalkylsilyne film at 300℃ after UV irradiation with photomask. The Si-Si chain of spin-coated polyalkylsilyne film was photooxidized by UV irradiation with photomask in air. The XPS spectra showed that the Si-O-Si chain of the UV-irradiated part changed into SiO_2 upon heat treatment in vacuo. On the other hand, the heat treatment changed the masked part into an a-Si-like structure with low optical band gap. The micrograph demonstrated lines of the irradiated area and spaces of the masked area.
- 社団法人応用物理学会の論文
- 1995-04-01
著者
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WATANABE Akira
Institute for Chemical Reaction Science, Tohoku University
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MATSUDA Minoru
Institute for Chemical Reaction Science, Tohoku University
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Nagai Yasuhiro
Nit Applied Electronics Laboratories
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Nagai Yoshinori
Institute For Chemical Reaction Science Tohoku University
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Matsuda Minoru
Institute For Chemical Reaction Science Tohoku University
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Watanabe Akira
Institute For Chemical Reaction Science Tohoku University
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