ポジティブ・ダイレクトマスク面露光による光造形法(設計支援手法・CAD/RP-III)

概要

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This paper proposes a new stereolithography using liquid photo-initiator and base resin (photopolymer resin without photo-initiator) separately. First, base resin is supplied as a layer, and then a mask pattern is drawn onto the surface with photo-initiator using inkJet printing. When the surface is exposed with a UV lamp, only the drawn pattern is cured by the photo-initiator. In this process, the photo-initiator works as a positive mask and the uncured base resin can be used again because it is not mixed with the photo-initiator. This paper also proposes multiple layers simultaneous exposure method. In our previous fabrication process, base resin supply, mask drawing and curing by exposure are repeated for every layer. On the other hand, our new method repeats only base resin supply and mask drawing for multiple layers and then cures the multiple layers simultaneously by an exposure. This new method should reduce both fabrication time and stair steps of fabricated model. The basic idea, fabrication system implementation and the results of some fabrication experiments are presented.
社団法人日本機械学会の論文
2004-11-29