ダイレクトマスク面露光による光造形法 : 光開始剤によるポジティブ・ダイレクトマスクの実現(機械要素,潤滑,工作,生産管理など)

概要

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This paper proposes a new selective area exposure method for stereolithography using liquid photoinitiator and base resin (photopolymer resin without photo-initiator) separately. First, base resin is supplied as a layer, and then a mask pattern is drawn onto the surface with photo-initiator using InkJet printing. When the surface is exposed with a UV lamp, only the drawn pattern is cured by the photo-initiator. In this process, the photo-initiator works as a positive mask and the uncured base resin can be used again because it is not mixed with the photo-initiator. The merits of this method are : (a) an area exposure instead of dot scanning enables fast fabrication, (b) no use of a laser or a mask device such as LCD leads to low cost, (c) keeping the base resin and photo-initiator separately leads to longer pot life of materials, and (d) low viscosity and no curability of liquid photo-initiator itself enable more stability and liability of inkjet process. The basic idea, fabrication system implementation and the results of some fabrication experiments are presented.
社団法人日本機械学会の論文
2005-11-25