228 by 248 Cell Charge-Coupled Image Sensor with Two-Level Overlapping Poly-Silicon Electrodes : B-4: IMAGING DEVICES
スポンサーリンク
概要
著者
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Aizawa Takashi
Central Research Laboratories Nippon Electric Co. Ltd.
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Shiraki Hiromitsu
Central Research Laboratories Nippon Electric Co. Ltd.
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Tanigawa Hiroshi
Central Research Laboratories Nippon Electric Co. Ltd.
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Hokari Yasuaki
Central Research Laboratories Nippon Electric Co. Ltd.
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ISHIHARA Yasuo
Central Research Laboratories, Nippon Electric Co., Ltd.
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ISHIHARA Tsutomu
Central Research Laboratories, Nippon Electric Co., Ltd.
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Ishihara Yasuo
Central Research Laboratories Nippon Electric Co. Ltd.
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Ishihara Tsutomu
Central Research Laboratories Nippon Electric Co. Ltd.
関連論文
- Bright Spots in the Image of Silicon Vidicon
- Video Defects in Charge-Coupled Image Sensors
- 228 by 248 Cell Charge-Coupled Image Sensor with Two-Level Overlapping Poly-Silicon Electrodes : B-4: IMAGING DEVICES
- Reduction of Silicon Vidicon Dark Current by HCI Oxidation
- Suppression of Stacking Fault Generation in Silicon Wafer by HCl Added to Dry O_2 Oxidation
- Secondary Defect Generation Suppression in Heavily Boron Implanted Silicon Wafers by HCl Oxidation
- Silicon Wafer Annealing Effect in Loop Defect Generation
- Stacking Fault Generation Suppression and Grown-In Defect Elimination in Dislocation Free Silicon Wafers by HCl Oxidation
- Elimination of Stacking Faults in Silicon Wafers by HCl Added Dry O_2 Oxidation
- Dislocation Etch Pits on Solution Grown Gallium Phosphide
- Secondary Defect Generation Suppression and Diffusivity Restraint in Heavily Phosphorus Implanted Silicon by HCI Oxidation