Shiraki Hiromitsu | Central Research Laboratories Nippon Electric Co. Ltd.

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概要

• 同名の論文著者
• Central Research Laboratories Nippon Electric Co. Ltd.の論文著者

関連著者

• Shiraki Hiromitsu

  Central Research Laboratories Nippon Electric Co. Ltd.

• Hokari Yasuaki

  Central Research Laboratories Nippon Electric Co. Ltd.

• HOKARI Yasuaki

  Central Research Laboratories, Nippon Electric Co., Ltd.

• Matsui Junji

  Central Research Labolatories Nippon Electric Co. Lid.

• Aizawa Takashi

  Central Research Laboratories Nippon Electric Co. Ltd.

• Kawamura Tsutomu

  Central Research Laboratories Nippon Electric Co. Ltd.

• SHIRAKI Hiromitsu

  Central Research Laboratories, Nippon Electric Co., Ltd.

• HANAOKA Masafumi

  Central Research Laboratories, Nippon Electric Co., Ltd.

• SASAKI Tokuo

  Central Research Laboratories, Nippon Electric Co., Ltd.

• Sasaki Tokuo

  Central Research Laboratories Nippon Electric Co. Ltd.

• Hanaoka Masafumi

  Central Research Laboratories Nippon Electric Co. Ltd.

• Shiraki Hiromitsu

  Central Research Laboratories Nippon Electric Company

• Shiraki Hiromitsu

  Central Research Laboratories Nippon Electric Company Limited

• Tanigawa Hiroshi

  Central Research Laboratories Nippon Electric Co. Ltd.

• ISHIHARA Yasuo

  Central Research Laboratories, Nippon Electric Co., Ltd.

• ISHIHARA Tsutomu

  Central Research Laboratories, Nippon Electric Co., Ltd.

• Ishihara Yasuo

  Central Research Laboratories Nippon Electric Co. Ltd.

• Ishihara Tsutomu

  Central Research Laboratories Nippon Electric Co. Ltd.

• SHIRAKI Hiromitsu

  Central Research Laboratories, Nippon Electric Co., Lid.

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著作論文

• Bright Spots in the Image of Silicon Vidicon
• Video Defects in Charge-Coupled Image Sensors
• 228 by 248 Cell Charge-Coupled Image Sensor with Two-Level Overlapping Poly-Silicon Electrodes : B-4: IMAGING DEVICES
• Reduction of Silicon Vidicon Dark Current by HCI Oxidation
• Suppression of Stacking Fault Generation in Silicon Wafer by HCl Added to Dry O_2 Oxidation
• Secondary Defect Generation Suppression in Heavily Boron Implanted Silicon Wafers by HCl Oxidation
• Silicon Wafer Annealing Effect in Loop Defect Generation
• Stacking Fault Generation Suppression and Grown-In Defect Elimination in Dislocation Free Silicon Wafers by HCl Oxidation
• Elimination of Stacking Faults in Silicon Wafers by HCl Added Dry O_2 Oxidation
• Dislocation Etch Pits on Solution Grown Gallium Phosphide

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