Epitaxial Growth of BaTi0_3 Optical Thin Films by Pulsed KrF Laser Deposition and in situ Pulsed Laser Annealing
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概要
- 論文の詳細を見る
A simple, hybrid process of pulsed KrF laser deposition (PLD) with in situ pulsed laser annealing has been demonstrated. By this method, epitaxial BaTiO3 optical thin (relatively thick) films with a thickness of up to 2 μm were successfully fabricated on a Mg0 substrate for the first time. By in situ pulsed KrF excimer laser irradiation of the surface of the growing film, i.e., in situ, laser annealing, good smoothness of the film surface and annealing of the film were achieved, allowing the thick film fabrication. The substrate temperature for the fabrication of epitaxial BaTi0_3 films was also reduced to 650℃ by incorporating the in situ pulsed laser annealing. Refractive indices of the films were measured to be about 2.30 -2.12, which is higher than for films without in situ laser annealing.
- 社団法人応用物理学会の論文
- 1997-06-15
著者
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小原 實
自衛隊中央病院
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Obara M
Keio Univ. Yokohama Jpn
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Obara Minoru
Department Of Electrical Engineering Faculty Of Engineering Keio University
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Ito Atsushi
Department Of Cardiovascular Surgery Okayama University Graduate School Of Medicine And Dentistry
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MACHIDA Akihiko
Department of Crystalline Materials Science, Nagoya University
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Machida Akihiko
Department Of Electronics And Electrical Engineering Faculty Of Science And Technology Keio Universi
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Ito Atsushi
Department Of Electronics And Electrical Engineering Faculty Of Science And Technology Keio Universi
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Ito Atsushi
Department Of Applied Chemistry College Of Engineering University Of Osaka Prefecture
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