Effects of Oxygen Addition on Diamond Film Growth by Electron-Cyclotron-Resonance Microwave Plasma CVD Apparatus
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-07-01
著者
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Fujiwara Yasuaki
Department Of Mechanical Engineering Nagaoka University Of Technology
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Fujiwara Yuichiro
Department Of Applied Physics The University Of Tokyo
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Sakuta Ken
Faculty Of Engineering Science Osaka University
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Komori Masaaki
Faculty Of Engineering Science Osaka University
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SUGIYO Masato
Power Source Technology Department, Advanced Component Division, Daihen Corporation
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Sugiyo Masato
Power Source Technology Department Advanced Component Division Daihen Corporation
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MINOMO Shoichiro
DAIHEN Corporation
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TANIGUCHI Michio
DAIHEN Corporation
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SUGIYO Masato
DAIHEN Corporation
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NUNOTANI Masayuki
Faculty of Engineering Science, Osaka University
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YAMASAWA Masahiro
Faculty of Engineering Science, Osaka University
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FUJIWARA Yasufumi
Faculty of Engineering Science, Osaka University
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K0BAYASHI Takeshi
Faculty of Engineering Science, Osaka University
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NAKASHIMA Shinichi
Faculty of Engineering, Osaka University
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Nakashima Shinichi
Faculty Of Engineering Osaka University
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Nunotani Masayuki
Faculty Of Engineering Science Osaka University
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Yamasawa Masahiro
Faculty Of Engineering Science Osaka University
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Fujiwara Y
Univ. Tokyo Tokyo
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