Ion Bombardment Enhanced Etching for Bi-Ca-Sr-Cu-O High-T_c Superconducting Thin Films : Etching and Deposition Technology
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-01-31
著者
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FUJIWARA Shuzo
National Institute of Materials and Chemical Research
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Suzuki S
Nikon Corp. Tokyo Jpn
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Suzuki Setsuo
Energy And Mechanical Research Laboratories Research And Development Center Toshiba Corporation
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Suzuki S
Chiba Institute Of Technology
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Suzuki Suguru
Department Of Materials Science And Engineering Nagoya Institute Of Technology
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Suzuki Susumu
Chiba Institute Of Technology
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Nakao Masao
Sanyo Electric. Co. Ltd. Tsukuba Research Center
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Nakao Masao
Sanyo Tsukuba Research Center
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YUASA Ryokan
SANYO Tsukuba Research Center
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FUJIWARA Shuji
Tsukuba Reseatch Center, SANYO Electric CO., Ltd
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YUASA Ryokan
Tsukuba Reseatch Center, SANYO Electric CO., Ltd
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SHIKICHI Kazuaki
Tsukuba Reseatch Center, SANYO Electric CO., Ltd
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MATSUTA Yuh
Tsukuba Reseatch Center, SANYO Electric CO., Ltd
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NAKAO Masao
Tsukuba Reseatch Center, SANYO Electric CO., Ltd
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SUZUKI Shigeo
Tsukuba Reseatch Center, SANYO Electric CO., Ltd
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Fujiwara S
National Institute Of Materials And Chemical Research
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Yuasa R
Sanyo Electric Co. Ltd. Tsukuba Jpn
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Matsuta Yuh
Tsukuba Reseatch Center Sanyo Electric Co. Ltd
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Yuasa Ryokan
Tsukuba Research Center Sanyo Electric Co. Ltd.
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Nakao M
Ntt
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Suzuki S
Research Center For Interface Quantum Electronics And Graduate School Of Electronics And Information
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Suzuki Setsu
School Of Science And Engineering Waseda University
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Shikichi K
Tsukuba Reseatch Center Sanyo Electric Co. Ltd
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