GaAs and InP Nanohole Arrays Fabricated by Reactive Beam Etching Using Highly Ordered Alumina Membranes
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-02-28
著者
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増田 秀樹
名古屋工業大学大学院おもひ領域工学研究科
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Oku Satoshi
NTT Opto-electronics Laboratories
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MASUDA Hideki
Department of Applied Chemistry, Nagoya Institute of Technology
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NAKAO Masashi
NTT Opto-electronics Laboratories
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Yasui K
Department Of Applied Chemistry Tokyo Metropolitan University
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TAMAMURA Toshiaki
NTT Opto-electronics Laboratories 3-1
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YASUI Kenshi
Department of Applied Chemistry, Faculty of Engineering, Tokyo Metropolitan University
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Nakao Masao
Sanyo Electric. Co. Ltd. Tsukuba Research Center
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Nakao Masao
Sanyo Tsukuba Research Center
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Oku S
Ntt Opto-electronics Laboratories
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Nakao M
Ntt
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TAMAMURA Toshiaki
NTT Electronics
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Yasui Kyuichi
Ultrasonic Processing Group Advanced Manufacturing Research Institute (amri) National Institute Of A
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Yasui Kenji
Department Of Applied Chemistry Tokyo Metropolitan University
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Tamamura T
Ntt Electronics
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Tamamura Toshiaki
Ntt Opto-electronics Laboratories
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Masuda Hideki
Department Of Applied Chemistry Faculty Of Engineering Nagoya Institute Of Technology
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