Direct Nanomolding of Semiconductor Single Crystals
スポンサーリンク
概要
- 論文の詳細を見る
An ordered array of concaves of nanometer-scale dimensions was fabricated by a direct momlding pocess on an InP single crystal using a SiC master mold. The obtained array of concaves could be applied for the preparation of an ordered textured surface of InP by a post-etching treatment. The treatment in hydrofluoric acid(HF)solution generated a highly ordered and textured surface composed of uniform pyramidal or triangular pits. The mold could be used repeatedly, and this method enables simple maskless patterning of semiconductor single crystals.
- 社団法人応用物理学会の論文
- 2000-03-15
著者
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西尾 和之
神奈川科学技術アカデミー
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YASUI Kenji
Department of Bioinformation Analysis, Research Institute of Environmental Medicine, Nagoya Universi
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増田 秀樹
名古屋工業大学大学院おもひ領域工学研究科
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MASUDA Hideki
Department of Applied Chemistry, Nagoya Institute of Technology
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NISHIO Kazuyuki
Department of Applied Chemistry, Tokyo Metropolitan University
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Yasui K
Department Of Applied Chemistry Tokyo Metropolitan University
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YANAGISHITA Takashi
Department of Applied Chemistry, Tokyo Metropolitan University
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Nakao Masao
Sanyo Electric. Co. Ltd. Tsukuba Research Center
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Nakao Masao
Sanyo Tsukuba Research Center
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Nakao M
Ntt
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Nakao Masashi
Ntt Photonics Laboratories:(present Office)tohoku University
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Nakao Masashi
Ntt Photonics Laboratories
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Nishio Kazuyuki
Department Of Applied Chemistry Faculty Of Engineering Tokyo Metropolitan University
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TAMAMURA Toshiaki
NTT Electronics
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TAMAMURA Toshiaki
NTT Basic Research Laboratories
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Yasui Kyuichi
Ultrasonic Processing Group Advanced Manufacturing Research Institute (amri) National Institute Of A
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Yasui Kenji
Department Of Applied Chemistry Tokyo Metropolitan University
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Yanagishita Takashi
Department Of Applied Chemistry Tokyo Metropolitan University
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Tamamura T
Ntt Electronics
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Masuda Hideki
Department Of Applied Chemistry Faculty Of Engineering Nagoya Institute Of Technology
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