Ideally Ordered Anodic Porous Alumina Mask Prepared by Imprinting of Vacuum-Evaporated Al on Si : Instrumentation, Measurement, and Fabrication Technology
スポンサーリンク
概要
- 論文の詳細を見る
Application of imprinting of vacuum-evaporated Al on a Si substrate using an SiC mold with an ordered array of hexagonally arranged convexes and subsequent anodization yielded an ideally ordered porous alumina mask on the substrate. The obtained alumina mask has sufficient adhesion to a Si substrate, and was used as a mask for vacuum evaporation of metal and ion milling of the Si substrate.
- 社団法人応用物理学会の論文
- 2001-11-15
著者
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西尾 和之
神奈川科学技術アカデミー
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YASUI Kenji
Department of Bioinformation Analysis, Research Institute of Environmental Medicine, Nagoya Universi
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増田 秀樹
名古屋工業大学大学院おもひ領域工学研究科
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MASUDA Hideki
Department of Applied Chemistry, Nagoya Institute of Technology
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NISHIO Kazuyuki
Department of Applied Chemistry, Tokyo Metropolitan University
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NAKAO Masashi
NTT Opto-electronics Laboratories
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Yasui K
Department Of Applied Chemistry Tokyo Metropolitan University
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Nakao Masao
Sanyo Electric. Co. Ltd. Tsukuba Research Center
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Nakao Masao
Sanyo Tsukuba Research Center
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Nakao M
Ntt
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Nishio Kazuyuki
Department Of Applied Chemistry Faculty Of Engineering Tokyo Metropolitan University
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Sakamoto Y
Department Of Applied Chemistry Tokyo Metropolitan University
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TAMAMURA Toshiaki
NTT Electronics
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Yasui Kyuichi
Ultrasonic Processing Group Advanced Manufacturing Research Institute (amri) National Institute Of A
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Yasui Kenji
Department Of Applied Chemistry Tokyo Metropolitan University
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Nakao Masashi
Ntt
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SAKAMOTO Yasuhisa
Department of Applied Chemistry, Tokyo Metropolitan University
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Tamamura T
Ntt Electronics
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Tamamura Toshiaki
Ntt Electrical Communications Laboratories
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Masuda Hideki
Department Of Applied Chemistry Faculty Of Engineering Nagoya Institute Of Technology
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